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Letters to the Editor

On Mask Fabrication Using an Optical Pattern Generator in the Direct Data Entry Mode

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Pages 457-459 | Received 11 Nov 1982, Published online: 10 Jul 2015

REFERENCES

  • R.L. Rosenfeld. Computer Assisted Mask Production, Proc. IEEE 57, 9; 1969; 1629–34.
  • J.M. Moran and R.L. Ruth. Meeting New Mask Making Needs, Bell Labs. Ree. 57, 7; 1979; 192–8.
  • D.S. Jacobson. Photomask manufacturing—requirements, capabilities and trends, Circuit manuf., 19, 10; 1979; 46–58.
  • R.A. Geshner The Electron Beam—A Better Way to Make Semiconductor Masks, Sol. Sta. Tech., June, 1979; 69.
  • D.K. Lynn. Computer Aided Layout system for IC, IEEE Trans. CT-18, 1; 1971; 128–39.
  • Electromask Inc; PG operation and maintenence manual, Electromask, Woodland Hills, CA, USA, 1980.
  • S.N. Gupta, A.K. Bagchi and D.R. Nagpal. Photomask Fabrication by Electromask system without CAD Tapes, Mask Making Tech, Rep. No. 1, Aug., 1982.

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