Photolithographic Methods for Vlsi: Myths and Beliefs

REFERENCES

• M.H. Eklund and G. Landrum. 1982 Forecast on Processing, Semiconductor International, Jan 1982; 43.
   Google Scholar
• R. Newman (Ed.). Fine line lithography, North Holland Publishing Company, 1980.
   Google Scholar
• Solid-State Technology. May 1978, special issue on Photolithography.
   Google Scholar
• D.B. Novotny and D.R. Ciarlo. Automated Photomask Inspection Part 1, Solid-Stale Technology. May 1978; 51.
   Google Scholar
• D.B. Novotny and Dino R. Ciarlo. Automated Photomask Inspection Part 2, Solid-State Technology, June 1978; 59.
   Google Scholar
• H. Yung and P. Eldrige. ECC Techniques Improve Automated Photomask Inspection, Semiconductor International, April 1981; 223.
   Google Scholar
• H. Binder and M. Lacombat. ‘Step and repeat Projection Printing for VLSI Circuit Fabrication’, IEEE Trans. ED-26, April 1979; 698.
   Google Scholar
• T. Goeders. Reticles for Wafer Imaging Systems, Solid-State Technology, May 1980; 81.
   Google Scholar
• J.H. Bruning. Optical Imaging for Microfabrication, Semiconductor International. April 1981; 137.
   Google Scholar
• P.S. Burggraaf. Photolithography Equipment Decisions, Semiconductor International, April 1981; 115.
   Google Scholar
• H.L. Stover. Stepping into the 80's with Die to Die Alignment, Solid-State Technology, May 1981: 112.
   Google Scholar
• P.S. Burggraaf. Wafer Steppers: Considering the Issues, Semiconductor International, April 1982; 57.
   Google Scholar
• R.E. Howard, Techniques for Ultra-Fine Pattern Generation, Solid-State Technology, August 1980; 127.
   Google Scholar
• P.S. Burggraaf. Photoresist Processing System: The Improvement, Semiconductor International, August 1981; 57.
   Google Scholar
• T.G.O. Neill. Photomask Materials Review, Semiconductor International, August 1981; 81.
   Google Scholar
• D.A. Swyt. Design of a pattern on a photomask-like Physical Standard for Evaluation and Calibration of Linewidth-Measuring Systems, Solid-State Technology, Jan. 1978; 35.
   Google Scholar
• M. Lacombat et al. Laser Projection Printing, Solid-State Technology, August 1980; 115.
   Google Scholar
• T.G.O. Neill. Clean Room Efficiency: A Combination of Design and Operation, Semiconductor International, Dec. 1980; 49.
   Google Scholar
• D.L. Angel et al. Characterization of Chromium on Glass Films for Use in the Manufacture of Photomasks, Semiconductor International, April 1981;179.
   Google Scholar
• J.S. Greeneich. Process Hurdles in Electron-beam Exposure of Sub-micron Patterns, Semiconductor International, April 1981; 159.
   Google Scholar
• W.D. Grobman et al. 1 μm MOSFET VLSI Technology: Part VI—Electron-Beam Lithography, IEEE Trans. ED-26, April 1970; 360.
   Google Scholar
• W.R. Hunter et al. 1 μm MOSFET VLSI Technology: Part V—A Single-Level Polysilicon Technology Using Electron-Beam Lithography, IEEE Trans. ED-26, April 1979; 353.
   Google Scholar
• D.E. Davis et al. Automatic Registration in an Electron-Beam Lithographic System, Solid-State Technology, August 1978; 61.
   Google Scholar
• G.W.W. Stevens. Reduction of Waste Resulting from Mask Defects, Solid-State Technology, August 1978; 69.
   Google Scholar
• J.N. Helbert et al. Electron Beam and Optical Evaluation of Dry Process Compatible Positive Photoresist, Semiconductor International, April 1981; 199.
   Google Scholar
• T. Batchelder & C. Takemoto. A Practical Multilayer Resist Process for 1 μm Lines, Semiconductor International. April 1981; 213.
   Google Scholar
• H.R. Rottmann. Overlay in Lithography, Semiconductor International, December 1980; 83.
   Google Scholar
• D.S. Perloff et al. Microelectronic Test Structures for Characterizing Fine-Line Lithography, Solid-State Technology, May 1981; 126.
   Google Scholar
• W.G. Oldham & A.R. Neureuther, Projection Lithography with High Numerical Aperture Optics, Solid-State Technology, May 1981; 106.
   Google Scholar
• D.N.K. Wang & D. Maydan. Dry Etching Technology for Fine Line Devices, Solid-State Technology, May 1981; 121.
   Google Scholar
• W. Oldham et al. A General Simulator for VLSI Lithography and Etching Processes, IEEE Trans. ED-26, April 1979; 717.
   Google Scholar
• H. Moritz. High-Resolution Lithography with Projection Printing, IEEE Trans. ED-26, Apr. 1979; 705.
   Google Scholar
• M.C. King. Future Developments for 1:1 Projection Photolithography, IEEE Trans. ED-26. April 1979; 711.
   Google Scholar
• D. Ann Doane. Optical Lithography in the 1-&mulm limit, Solid-State Technology, Aug. 1980; 101.
   Google Scholar
• D.J. Elliot. Increasing the Functional Speed of Positive Photoresist, Solid-State Technology Sept. 1977; 66.
   Google Scholar
• B. Leon. Photoresist Scumming-Part 1. The Nature of Negative Photoresist Scumming., Solid-State Technology, Apr 1977; 71.
   Google Scholar
• K.G. Clark. Photoresist Technology and Processing Techniques for Fine Dimension Control, Solid-State Technology, Aug. 1978; 73.
   Google Scholar
• E. Bassous et al. High Transmission X-ray Masks for Lithographic Applications, Solid-State Technology, Sept. 1976; 55.
   Google Scholar
• J.H. McCoy & P.A. Sullivan. Mask alignment for the Fabrication of Integrated Circuits Using X-ray Lithography, Solid-State Technology, Sept. 1976; 59.
   Google Scholar
• R.G. Geev. Computer-Aided Coarse Grid Layout Technique for Photomasks, Solid-State Technology, Sept. 1976; 65.
   Google Scholar