REFERENCES
- S M Sze, Ed, VLSI Technology, (2nd ed) McGraw Hill Book Company, NY, 1988, p 184.
- S M Sze, Ed, VLSI Technology, (2nd ed) McGraw Hill Book Company, NY, 1988, p 262.
- S K Ghandhi, VLSI Fabrication Principles, John Wiley & Sons, NY, 1983, p 547.
- J Mort & F Jansen, Ed, Plasma Deposited Thin Films, CRC, Boca Raton, FL, 1986.
- K Yokota, S Nakayama, Y Ono & S Katamaya, Jpn J Appl Phys, vol 26, p 965, 1987.
- M J Rand, J Vac Sci Technol, vol 16, p 420, 1979.
- A Mastsuda & K Tanaka, Thin Solid Films, vol 92, p 171, 1982.
- A Matsuda, K Kumagai & K Tanaka, Jpn J Appl Phys, vol 22, p L34, 1983.
- M Tanaka, K Ninomiya, N Nakamura, S Tsuda, S Nakano, M Onishi & Y Kuwano, Jpn J Appl Phys, vol 27, p 14, 1988.
- A T Bell, J Vac Sci Technol, vol 16, p 418, 1979.
- I Haller, Appl Phys Lett, vol 37, p 282, 1980.
- M A Weakleim, R D Estes & P A Longeway, J Vac Sci Technol, vol A5, p 29, 1987.
- B Drevillon, J Huc, A Lloret, J Perrin, G de Rosny & J P M Schmitt, Appl Phys Lett, vol 37, p 646, 1980.
- B Drevillon, J Huc, A Lloret, J Perrin, G de Rosny, J P M Schmitt & J M Siefert, Appl Phys Lett, vol 42, p 801, 1983.
- G Turban, Y Catherine & B Grollean, Plasma Chemistry and Plasma Processing, vol 2, p 61, 1982.
- R C Ross & J Jaklik Jr, J Appl Phys, vol 55, p 3785, 1984.
- H Fritzsche, M Tanalien, C C Tsai & P J Gaczi, J Appl Phys, vol 50, p 3366, 1979.
- B A Scott & J A Reimer, J Appl Phys, vol 54, p 6853, 1983.