REFERENCES
- R Singh, Rapid isothermal processing, J App Phys, vol 63, pp R59–R114, April 1988.
- K C Saraswat, L Booth, D D Grossman, B T Khuri-Yakub, Y J Lee & M M Moslehi, Rapid Isothermal Processing, (Ed R Singh), Int Soc of Optical Engr, pp 2–5, 1990.
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- R Singh, P Chou, F Radpour, H S Ullal & A J Nelson, Oxidation of tin on silicon substrate by rapid isothermal processing, J App Phys, vol 66, pp 2381–2387, Sept 1989.
- R Singh, S Sinha, R P S Thakur & P Chou, Some photo effect roles in rapid isothermal processing, Appl Phys Lett, vol 58, pp 1217–1219, March 1991.
- T Ishitani, K Umemura, Y Kawanami, & T Ohnishi, Development of liquid-metal-ion sources for focused-ion-beam applications, J Electrochem Soc, vol 136, pp 3502–3505, Nov 1989.
- R Singh, R P S Thakur, A Katz, A J Nelson, S C Gebhard & A B Swartzlander, Low thermal budget solid phase epitaxial growth of CaF2 on Si (111) substrates, J Electronic Materials, vol 19, pp 1061–1064, June 1990.
- R Singh, R P S Thakur, A Katz, A J Nelson, S C Gebhard & A B Swartzlander, Relationship between thermal stress and structural properties of SrF2 films on (100) InP, App Phys Lett, vol 57, pp 1239–1241, Sept 1990.