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Original Articles

Sub-100 nm Ferroelectric-Gate Thin-Film Transistor with Low-Temperature PZT Fabricated on SiO2/Si Substrate

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Pages 65-74 | Accepted 09 Dec 2014, Published online: 05 May 2015

References

  • I. Shong, S. Kim, H. Yin, C.J. Kim, J. Park, S. Kim, H.S. Choi, E. Lee, and Y. Park, Short channel characteristics of gallium-indium-zinc-oxide thin film transistors for three-dimensional stacking memory. IEEE Electron Device Lett., 29(6), 549–552 (2008).
  • Y. Cao, M.L. Steigerwald, C. Nuckolls, and X. Guo, Current trends in shrinking the channel length of organic transistors down to the nanoscale. Adv. Mater., 22(1), 20–32 (2010).
  • W. Zhang and S.Y. Chou, Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels. Appl. Phys. Lett., 83(8), 1632–1634 (2003).
  • J. Tang, Y. Wang, J.E. Klare, G.S. Tulevski, S.J. Wind, C. Nuckolls, Encoding molecular-wire formation within nanoscale sockets. Angew. Chem, 119(21), 3966–3969 (2007).
  • D. Gupta, M. Anand, S.W. Ryu, Y.K. Choi, and S.H. Yoo, Nonvolatile memory based on sol-gel ZnO thin-film transistors with Ag nanoparticles embedded in the ZnO/gate insulator interface. Appl. Phys. Lett., 93(22), 224106 (2008).
  • G.H. Kim, B.D. Ahn, H.S. Shin, W.H. Jeong, H.J. Kim, and H.J. Kim, Effect of indium composition ratio on solution-processed nanocrystalline InGaZnO thin film transistors. Appl. Phys. Lett., 94(23), 233501 (2009).
  • C.G. Choi, S.J. Seo, and B.S. Bae, Solution-processed indium-zinc oxide transparent thin-film transistors. Electrochem. Solid-State. Lett., 11(1), H7–H9 (2008).
  • H.S. Kim, M.G. Kim, Y.G. Ha, M.G. Kanatzidis, T.J. Marks, and A. Facchetti, Low-temperature solution-processed amorphous indium tin oxide field-effect transistors. J. Am. Chem. Soc., 131(31), 10826–10827 (2009).
  • T. Miyasako, B.N. Q. Trinh, M. Onoue, T. Kaneda, P.T. Tue, E. Tokumitsu, and T. Shimoda, Totally solution-processed ferroelectric-gate thin-film transistor, Appl. Phys. Lett., 97(17), 173509 (2010).
  • International Technology Roadmap for Semiconductors (ITRS), Technical Report (2012).
  • L.V. Hai, M. Takahashi, and S. Sakai, Fabrication and characterization of sub-0.6-μm ferroelectric-gate field-effect transistors. Semicond. Sci. Technol., 25(11), 115013 (2010).
  • Y. Kaneko, Y. Nishitani, M. Ueda, E. Tokumitsu, and Eiji Fujii, A 60nm channel length ferroelectric-gate field-effect transistor capable of fast switching and multilevel programming. Appl. Phys. Lett., 99(18), 182902 (2011).
  • J. Li, H. Kameda, B.N. Q. Trinh, T. Miyasako, P.T. Tue, E. Tokumitsu, T. Mitani and T. Shimoda, A low-temperature crystallization path for device-quality ferroelectric films. Appl. Phys. Lett., 97(10), 102905 (2010).
  • S.J. Choi, J.W. Han, S. Kim, D.I. Moon, M. Jang, and Y.K. Choi, High-performance polycrystalline silicon TFT on the structure of a dopant-segregated schottky-barrier source/drain. IEEE Electron Device Lett., 31(3), 228–230 (2010).
  • H. Uchida, K. Takechi, S. Nishida, and S. Kaneko, High-mobility and high-stability a-Si:H thin film transistors with smooth SiNx/a-Si interface. Jpn. J. Appl. Phys., 30(12B), 3691–3694 (1991).

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