IMPORTANCE OF GRID REFINEMENT IN NUMERICAL MODELING OF CHEMICAL VAPOR DEPOSITION PROCESSES

References

• Coltrin , M. E. , Kee , R. J. and Miller , J. A. 1984 . A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor . J. Electrochem. Soc. , 131 : 425 – 434 .
   Web of Science ®Google Scholar
• Kleijn , C. R. and Werner , C. 1984 . Modeling of Chemical Vapor Deposition of Tungsten Films , Boston, MA : Birkhauser Verlag .
   Google Scholar
• Roenigk , K. F. and Jensen , K. F. 1985 . Analysis of Multicomponent LPCVD Process . J. Electrochem. Soc. , 132 : 448 – 454 .
   Web of Science ®Google Scholar
• Jensen , K. F. , Fotiadis , D. I. , Einset , E. O. , Kremer , A. M. and McKenna , D. R. 1987 . Fluid Mechanics of Chemical Vapor Deposition . Interdisc. Issues Mater. Process. Manufact., ASME , 2 : 565 – 585 .
   Google Scholar
• Coltrin , M. E. , Kee , R. J. and Evans , G. H. 1989 . A Mathematical Model of the Fluid Mechanics and Gas Phase Chemistry in a Rotating Disk CVD Reactor . J. Electrochem. Soc. , 136 : 819 – 829 .
   Web of Science ®Google Scholar
• S. A. Gokoglu, M. Kuczmarski, P. Tsui, and A. Chait, Convection and Chemistry Effects in CVD--A 3-D Analysis for Silicon Deposition, Proc. Seventh European Conf. on Chemical Vapor Deposition, pp. C5-17-C5-34, M. Ducarroir, C. Bernard, and L. Vandenbulcke, Eds., Perpignan, France, 1989.
   Google Scholar
• Amer , S. A. , Couderc , J. P. and Duverneuil , P. 1994 . Three-Dimensional Modeling of LPCVD Vertical Cold Wall Reactors . Comput. Chem. Eng. , 18 : s235 – s239 .
   Google Scholar
• Mahajan , R. L. and Wei , C. 1991 . Buoyancy, Soret, Dufour, and Variable Properly Effects in Silicon Epitaxy . J. Heat Transfer , 113 : 688 – 695 .
   Google Scholar
• Houtman , C. , Graves , D. B. and Jensen , K. F. 1986 . CVD in Stagnation Point Flow . J. Electrochem. Soc. , 133 : 961 – 969 .
   Web of Science ®Google Scholar
• Kleijn , C. R. and Hoogendoorn , C. J. 1991 . A Study of 2- and 3-D Transport Phenomena in Horizontal Chemical Vapor Deposition Reactors . Chem. Eng. Sci , 46 : 321 – 334 .
   Web of Science ®Google Scholar
• S. A. Gokoglu, Chemical Vapor Deposition Modeling--An Assessment of Current Status, Proc. Eleventh Int. Conf. on Chemical Vapor Deposition, pp. 1-9, K. E. Spear and G. W. Cullen, Seattle, WA, October, 1990.
   Google Scholar
• D. Zhu and Y. Sahai, Mathematical Modeling of Transport Phenomena in Chemical Vapor Deposition Processes, Proceedings of the Second Int. Symp. on Process Physics and Modeling in Semiconductor Technology, pp. 722-737, G. R. Srinivasan, J. Plummer, and S. T. Pantelides, Eds., The Electrochemical Society, Pennington, NJ, 1991.
   Google Scholar
• Brown , P. , Zhu , D. and Sahai , Y. 1993 . Transport Phenomena in Chemical Vapor Deposition of Silicon Carbide by the MTS/Hydrogen System . J. Mater. Process. Manufact. Sci , 1 : 247 – 259 .
   Google Scholar
• Kleijn , C. R. 2000 . Computational Modeling of Transport Phenomena and Detailed Chemistry in Chemical Vapor Deposition--A Benchmark Solution . Thin Solid Films , 365 : 294 – 306 .
   Google Scholar
• Moffat , H. K. and Jensen , K. F. 1988 . Three-Dimensional Flow Effects in Silicon CVD in Horizontal Reactors . J. Electrochem. Soc. , 135 : 459 – 471 .
   Web of Science ®Google Scholar
• Wang , Y. B. , Chaussavoine , C. and Teyssandier , F. 1993 . 2-D Modelling of a Non-Confined Circular Impinging Jet Reactor; Si Chemical Vapour Deposition . J. Crystal Growth , 126 : 373 – 395 .
   Google Scholar
• Kleijn , C. R. 1991 . A Mathematical Model for the Hydrodynamics and Gas Phase Reactions in Silicon LPCVD in a Single Wafer Reactor . J. Electrochem. Soc. , 138 : 2190 – 2200 .
   Google Scholar
• Bird , R. B. , Stewart , W. E. and Lightfoot , E. N. 1960 . Transport Phenomena , New York : Wiley .
   Google Scholar
• F. H. Moukalled, Adaptive Grid Solution Procedure for Elliptic Flows, Ph.D. thesis, Louisiana State University, Baton Rouge, LA, 1987.
   Google Scholar
• Patankar , S. V. 1980 . Numerical Heat Transfer and Fluid Flow , Washington, DC : Hemisphere .
   Google Scholar
• White , F. 1991 . Viscous Fluid Flow , 2nd , 157 New York : McGraw-Hill .
   Google Scholar