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Radiation Effects and Defects in Solids

Incorporating Plasma Science and Plasma Technology

Volume 108, 1989 - Issue 2-4

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Secondary ion emission from organic films under bombardment with a ³²S beam at 3 MeV/A

F. Riggi Dipartimento di Fisica, Università di Catania, Corso Italia 57, 195129, Catania, Italy; Istituto Nazionale di Fisica Nucleare, Sezione di Catania

R. M. Spina Dipartimento di Fisica, Università di Catania, Corso Italia 57, 195129, Catania, Italy; Istituto Nazionale di Fisica Nucleare, Sezione di Catania

Pages 251-255 | Received 28 Nov 1988, Published online: 19 Aug 2006

Cite this article
https://doi.org/10.1080/10420158908230313

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Secondary ion emission from organic films under bombardment with a ³²S beam at 3 MeV/A

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Secondary ion emission from organic films under bombardment with a 32S beam at 3 MeV/A

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Secondary ion emission from organic films under bombardment with a ³²S beam at 3 MeV/A