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Integrated Ferroelectrics
An International Journal
Volume 40, 2001 - Issue 1-5
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Original Articles

An improved behavioral model of ferroelectric capacitors

Chun-Xiao Li Institute of Microelectronics, Tsinghua University, Beijing, 100084, P. R. China
,
Tian-Ling Ren Institute of Microelectronics, Tsinghua University, Beijing, 100084, P. R. China
,
Wu-Quan Zhang Institute of Microelectronics, Tsinghua University, Beijing, 100084, P. R. China
,
Jun Zhu Institute of Microelectronics, Tsinghua University, Beijing, 100084, P. R. China
,
Hong-Yi Chen Institute of Microelectronics, Tsinghua University, Beijing, 100084, P. R. China
,
Li-Tian Liu Institute of Microelectronics, Tsinghua University, Beijing, 100084, P. R. China
&
Zhi-Jian Li Institute of Microelectronics, Tsinghua University, Beijing, 100084, P. R. China
 show all
Pages 93-100 | Received 14 Mar 2001, Published online: 19 Aug 2006

References

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