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Integrated Ferroelectrics
An International Journal
Volume 66, 2004 - Issue 1
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Original Articles

Profile and Etch Characterization of High Wafer Temperature Etched Y1/Pt Stacks

S. MARKS Tegal Corporation Petaluma, California, U.S.A
&
J. P. ALMERICO Tegal Corporation Petaluma, California, U.S.A
Pages 19-27 | Received 01 May 2004, Accepted 01 May 2004, Published online: 12 Aug 2010

REFERENCES

  • CRC Press . Handbook of Chem. and Phys. , 64th ed. 65 103 135 151 157 Sect. B
  • Marks , S. 2003 . “The profile and device characterization of high wafer temperature etched Ir/PZT/Ir stacks,” Paper 1.2.7-C, 15th ISIF
  • Summerfelt , S. R. 2003 . “Embedded ferroeelectric memory with 0.58 micron cell size Using 130 nm 5LM Cu/FSG logic process,” Paper 1.1.5-I; 15th ISIF

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