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Integrated Ferroelectrics

An International Journal

Volume 131, 2011 - Issue 1

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Original Articles

Improved Electrical Properties of Cr-Doped K_0.5Bi_4.5Ti₄O₁₅ Thin Films Fabricated by Chemical Solution Deposition

D. Do Department of Physics, Changwon National University, Changwon, Kyungnam, 641-773, Republic of Korea

S. S. Kim Department of Physics, Changwon National University, Changwon, Kyungnam, 641-773, Republic of Korea

A. S. Bhalla Department of Electrical and Computer Engineering, The University of Texas at San Antonio, San Antonio, Texas, 78249-0669, USA

Pages 95-101 | Received 15 Apr 2011, Published online: 16 Dec 2011

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https://doi.org/10.1080/10584587.2011.616421

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Improved Electrical Properties of Cr-Doped K_0.5Bi_4.5Ti₄O₁₅ Thin Films Fabricated by Chemical Solution Deposition