References
- Adler , D. 1968 . Mechanisms for Metal-Nonmetal Transitions in Transition Metal Oxides and Sulfides . Rev. Mod. Phys. , 40 : 714 – 736 .
- Surnev , S. , Ramsey , M. G. and Netzer , F. P. 2003 . Vanadium oxide surface studies . Prog. Surf. Sci. , 73 ( 4–8 ) : 117 – 165 .
- Radu , I. P. 2011 . (Invited) Vanadium oxide as a memory material . ECS Trans. , 35 : 233 – 243 .
- Choi , S. B. , Kyoung , J. S. Kim , H. S. 2011 . Nanopattern enabled terahertz all-optical switching on vanadium dioxide thin film . Appl. Phys. Lett. , 98 : 071105
- Root , M. J. 2011 . Resistance model for lithium-silver vanadium oxide cells . Journal of the Electrochemical Society. , 158 ( 12 ) : A1347 – A1353 .
- Coppinger , M. J. , Sustersic , N. A. and Kolodzey , J. 2011 . Sensitivity of a vanadium oxide uncooled microbolometer array for terahertz imaging . Opt. Eng. , 50 ( 5 ) : 053206
- Fieldhouse , N. , Pursel , S. M. Carey , R. 2009 . Vanadium oxide thin films for bolometric applications deposited by reactive pulsed dc sputtering . J. Vac. Sci. Technol. , A 27 ( 4 ) : 951 – 955 .
- Safi , I. 2000 . Recent aspects concerning DC reactive magnetron sputtering of thin films a Review . Surf. Coat. Tech. , 127 ( 2–3 ) : 203 – 218 .
- Berg , S. and Nyberg , T. 2005 . Fundamental understanding and modeling of reactive sputtering processes . Thin Solid Films. , 476 ( 2 ) : 215 – 230 .
- Theil , J. A. and Kusano , E. 1997 . Angus Rockett, Vanadium Reactive Magnetron Sputtering in Mixed Ar/O2 Discharges . Thin Solid Films. , 298 : 122 – 129 .
- Riccardi , P. , Ishimot , M. , Barone , P. and Baragiola , R. A. 2004 . Ion-Induced Electron Emission from MgO by Exciton Decay into Vacuum . Surf. Sci. Lett. , 571 : L305 – L310 .
- Depla , D. , Heirwegh , S. , Mahieu , S. , Haemers , J. and De Gryse , R. 2007 . Understanding the discharge voltage behavior during reactive sputtering of oxides . J. Appl. Phys. , 101 013301-1∼013301-9
- Depla , D. and De Gryse , R. 2002 . Cross section for removing chemisorbed oxygen from an aluminum target by sputtering . J. Vac. Sci. Technol. A , 20 : 521 – 525 .
- Snyders , R. , Gouttebaron , R. , Dauchot , J. P. and Hecq , M. 2004 . Metallic tin reactive sputtering in a mixture Ar–O2: Comparison between an amplified and a classical magnetron discharge . J. Vac. Sci. Technol. A , 22 : 1540 – 1545 .