References
- G. Subramanyam, M.W. Cole, N.X. Sun, T.S. Kalkur, N.M. Sbrockey, G.S. Tompa, X. Guo, C. Chen, S.P. Alpay, G.A. Rossetti, Jr., K. Dayal, L-Q Chen, and D. Schlom, J. Appl. Phys. 1141301
- P. Bao, T.J. Jackson, X. Wang, and M.J. Lancaster, J. Phys, D: Appl. Phys. 41, 063001 (2008).
- F.A. Miranda, F.W. van Keuls, R.R. Romanofsky, C.H. Mueller, S. Alterovitz, and G. Subramanyam, Integr. Ferroelectr. 42, 131 (2002).
- P. Cruz, N.B. Carvalho, and K.A. Remley, IEEE Microw. Mag. 11, 83 (2010).
- G. Subramanyam, F. Ahamed, R. Biggers, R. Neidhard, E. Nykiel, J. Ebel, R. Strawser, K. Stamper, and M. Calcatera, Microwave Opt. Technol. Lett. 47(4), 370 (2005).
- M. Jain, S.B. Majumder, R.S. Katiyar, D.C. Agrawal, and A.S. Bhalla, Appl. Phys. Lett., 81, 3212 (2002).
- K.V. Saravanan, K. Sudheendran, K.C. J. Raju, Electron. Mater. Lett. 8, 571 (2012).
- M. Jain, S.B. Majumder, R.S. Katiyar, and A.S. Bhalla, Mater. Lett., 57, 4232 (2003).
- A. Kozyrev, A. Ivanov, T. Samoilova, O. Soldatenkov, K. Astafiev, and L. Sengupta, J. Appl. Phys. 88, 5334 (2000).
- J. Nath, D. Ghosh, J.P. Maria, A.I. Kingon, W. Fathelbab, P.D. Franzon, and M.B. Steer, IEEE Trans. MTT 53, 2707 (2005).
- M.W. Cole, C.V. Weiss, E. Ngo et al. , Appl. Phys. Lett. 92, 182906 (2008).
- S. Zhong, S.P. Alpay, M.W. Cole et al. , Appl. Phys. Lett. 90, 092901 (2007).
- P.S. Dobal, A. Dixit, R.S. Katiyar, D. Gracia, R. Guo, A.S. Bhalla, Ferroelectrics Lett. 29, 1 (2002).
- JCPDS card No. 34-0411
- A.K. Tagantsev, V.O. Sherman, K.F. Astafiev, J. Venkatesh, and N. Setter, J. Electroceram. 11, 5 (2003).
- K.V. Saravanan, M.G. Krishna, and K.C. James Raju, J. Appl. Phys. 106, 114102 (2009).
- JCPDS Card No. 04-0802.
- N.A. Pertsev, A.G. Zembilgotov, and A.K. Tagantsev, Phys. Rev. Lett. 80, 1988
- Y.L. Li, S.Y. Hu, Z.K. Liu, and L.Q. Chen, Appl. Phys. Lett. 78, 3878 (2001).
- D.A. Tenne, A. Soukiassian, X.X. Xi, T.R. Taylor, P.J. Hansen, J.S. Speck and R.A. York, Appl. Phys. Lett., 85, 4124 (2004).
- N.A. Pertsev, A.G. Zembilgotov, S. Hoffmann, R. Waser, and A.K. Tagantsev, J. Appl. Phys. 85, 1698
- T. Maiti, R. Guo, and A.S. Bhalla, Ferroelectrics, 425, 4 (2011).
- K. Uchini and S. Namura, Ferroelectr. Lett. Sect. 34, 2551
- S. Subrahmanyam and E. Goo, Acta Mater. 46, 817 (1998).
- R. Ganesh and E. Goo, J. Am. Ceram. Soc. 89, 653 (1997).
- W.F. Qin, J. Xiong, J. Zhu, J.L. Tang, W.J. Jie, H. Wei, Y. Zhang, and Y.R. Li, J Mater Sci: Mater Electron 19, 429 (2008).
- A.Q. Jiang, J.F. Scott, M. Dawber, and C. Wang, J. Appl. Phys. 92, 6756 (2002).
- N. Ortega, A. Kumar, O. Resto, O.A. Maslova, Y.I. Yuzyuk, J.F. Scott, R.S. Katiyar, J. Appl. Phys., 114, 104102 (2013).