References
- Coburn , J. W. 1982. . “ Plasma etching and reactive ion etching ” . In in American Vacuum Society Monograph Series , Edited by: Whetten , N. Rey . New York : American Institute of Physics .
- Chapman , B. 1980 . “ Glow Discharge Processes, Sputtering and Plasma Etching ” . New York : Wiley .
- Poor , M. R. and Fleddermann , C. B. 1991 . J. Appl. Phys. , 70 : 3385
- Kawaguchi , T. , Adachi , H. , Setsune , K. , Yamazaki , O. and Wasa , K. 1984 . Applied Optics , 23 : 2187
- Xu , T. , Wu , A. Y. and Brueck , S. R. J. Journal of Applied Physics , submitted.
- Title , M. A. , Walpita , L. M. , Chen , W.-X. , Lee , S. and Chang , W. S. C. 1986 . Applied Optics , 25 : 1508
- Baude , P. F. , Ye , C. , Tamagawa , T. and Polla , D. L. 1993 . J. Appl. Phys. , 73 : 7960
- Saito , K. , Choi , J. H. , Fukuda , T. and Ohue , M. 1992 . Jpn. J. Appl. Phys. , 31 ( 2 ) : L1260
- Vijay , D. P. , Desu , S. B. and Pan , W. 1993 . J. Electrochem. Soc. , 140 : 2635
- Poor , M. R. , Hurd , A. M. , Fleddermann , C. B. and Wu , A. Y. 1990 . Ferroelectric Thin Films , Edited by: Myers , E. R. and Kingon , A. I. Vol. 200 , 211 – 216 . Pittsburgh, PA : Mater. Res. Soc. Proc. .