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Integrated Ferroelectrics
An International Journal
Volume 17, 1997 - Issue 1-4
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Device integration

The role of buffer layer in strontium bismuth tantalate based ferroelectric gate mos structures for non-volatile non destructive read out memory applications

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Pages 433-441 | Published online: 19 Aug 2006

References

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  • Kalkur , T. S. , Jacobs , Brad and Argos , Gorge . 1994 . Integrated Ferroelectrics , 5 : 177 – 184 .
  • Kulkarni , J. R. 1991 . “ Studies of Metal-Ferroelectric-Silicon MIS capacitors using Bismuth Titanate and Barium Magnesium Fluoride ” . University of Colorado at Colorado springs . Thesis(MSEE)
  • Gregory , J. W. , Cuchiaro , J. D. , Arauojo , C. A. and McMillan , L. D. 1995 . The effect of thin film scaling on the capacitance vs. voltage characteristics of a memory cell . Integrated Ferroelectrics , 6 : 281 – 288 .
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  • Wu , S. Y. 1974 . A new ferroelectric memory device, Metal ferroelectric semiconductor transistor . IEEE Trans. Electron Devices , ED-21 ( 8 ) : 499
  • Lim , M. and Kalkur , T. S. 1997 . Electrical Characteristics of Pt-Bismuth Strontium Tantalate -p-Si with Zirconium Oxide buffer layer . Integrated Ferroelectrics , 14 : 247 – 257 .

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