Second generation liquid source misted chemical deposition (LSMCD) technology for ferroelectric thin films

References

• Ami , T. , Hironaka , K. , Isobe , C. , Nagel , N. , Sugiyama , M. , Ikeda , Y. , Watanabe , K. , Machida , A. , Miura , K. and Tanaka , M. 1997 . Proceedings of 9th International Symposium on Integrated Ferroelectrics In Press
   Google Scholar
• Van , P. C. , Roeder , J. F. and Bilodeau , S. 1995 . Integrated Ferroelectrics , 10 : 9
   Web of Science ®Google Scholar
• Van , P. C. , Bilodeau , S. M. , Roeder , J. F. and Kirlin , P. S. 1995 . Proceedings of Dry Process Symposium , IV-2
   Google Scholar
• Huffman , M. 1995 . Integrated Ferroelectrics , 10 : 39
   Web of Science ®Google Scholar
• Solayappan , N. , Derbenwick , G. F. , McMillan , L. D. , Araujo , C. P. and Hayashi , S. 1997 . Integrated Ferroelectrics , 14 : 237
   Web of Science ®Google Scholar