Direct deposition of SrBi₂Ta₂O₉ Film on IrO₂ electrode using liquid source CVD method

Takashi Eshita Fujitsu Laboratories Ltd, 10-1 Morinosato-Wakamiya, Atsugi, 2430197, Japan

Hideki Yamawaki Fujitsu Laboratories Ltd, 10-1 Morinosato-Wakamiya, Atsugi, 2430197, Japan

Shinji Miyagaki Fujitsu Laboratories Ltd, 10-1 Morinosato-Wakamiya, Atsugi, 2430197, Japan

Yoshihiro Arimoto Fujitsu Laboratories Ltd, 10-1 Morinosato-Wakamiya, Atsugi, 2430197, Japan

References

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Yamawaki , H. , Miyagaki , S. , Eshita , T. and Arimoto , Y. 1998 . Ext. Abstr. 1988 Int. Conf. Solid State Devices and Materials, Hiroshima . 102
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Direct deposition of SrBi₂Ta₂O₉ Film on IrO₂ electrode using liquid source CVD method

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Direct deposition of SrBi2Ta2O9 Film on IrO2 electrode using liquid source CVD method

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Direct deposition of SrBi₂Ta₂O₉ Film on IrO₂ electrode using liquid source CVD method