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Integrated Ferroelectrics
An International Journal
Volume 27, 1999 - Issue 1-4
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Section N: Circuits and devices

Integration technology for ferroelectric memory

Hiromitsu Hada Silicon Systems Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa, 229-1198, JAPAN
,
Nobuhiro Tanabe Silicon Systems Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa, 229-1198, JAPAN
,
Kzushi Amanuma Silicon Systems Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa, 229-1198, JAPAN
,
Toru Tatsumi Silicon Systems Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa, 229-1198, JAPAN
,
Sota Kobayashi Silicon Systems Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa, 229-1198, JAPAN
&
Takemitsu Kunio Silicon Systems Research Laboratories, NEC Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa, 229-1198, JAPAN
Pages 257-269 | Received 07 Mar 1999, Published online: 19 Aug 2006

References

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