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Science and Technology of Advanced Materials Volume 17, 2016 - Issue 1
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Optical, magnetic and electronic device materials

Silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge

Daniele Scopecenanotech@surfaces laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600, Dübendorf, SwitzerlandCorrespondence[email protected] [email protected]
,
Max DöbeliIon Beam Physics, ETH Zürich, Otto-Stern-Weg 5, CH-8093, Zürich, Switzerland
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Daniele Passeronenanotech@surfaces laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600, Dübendorf, Switzerland
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Xavier MaederLaboratory for Nanoscale Materials Science, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600Dübendorf, Switzerland
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Antonia NeelsCenter for X-ray Analytics, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600Dübendorf, Switzerland
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Beno WidrigOerlikon Surface Solutions AG, Oerlikon Balzers, Iramali 18, 9469Balzers, Liechtenstein
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Alex Dommannnanotech@surfaces laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600, Dübendorf, Switzerland
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Ulrich MüllerLaboratory for Nanoscale Materials Science, Empa, Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600Dübendorf, Switzerland
&
Jürgen RammOerlikon Surface Solutions AG, Oerlikon Balzers, Iramali 18, 9469Balzers, Liechtenstein
 show all
Pages 20-28 | Received 25 Sep 2015, Accepted 12 Dec 2015, Published online: 23 Feb 2016

References

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