2,995
Views
6
CrossRef citations to date
0
Altmetric
Engineering and Structural materials

Effect of Si on the oxidation reaction of α-Ti(0 0 0 1) surface: ab initio molecular dynamics study

ORCID Icon, , &
Pages 998-1004 | Received 14 Jun 2017, Accepted 07 Nov 2017, Published online: 13 Dec 2017

References

  • Boyer RR. An overview on the use of titanium in the aerospace industry. Mater Sci Eng A. 1996;213:103–114.10.1016/0921-5093(96)10233-1
  • Kosaka Y, Faller K, Fox SP. Newly developed titanium alloy sheets for the exhaust systems of motorcycles and automobiles. JOM. 2004;56:32–34.10.1007/s11837-004-0249-5
  • Froes FH, Suryanarayana C, Eliezer D. Synthesis, properties and applications of titanium aluminides. J Mater Sci. 1992;27:5113–5140.10.1007/BF02403806
  • Stringer J. The oxidation of titanium in oxygen at high temperatures. Acta Metall. 1960;8:758–766.10.1016/0001-6160(60)90170-X
  • Kofstad P. High-temperature oxidation of titanium. J Less Common Met. 1967;12:449–464.10.1016/0022-5088(67)90017-3
  • Chaze AM, Coddet C. Influence of alloying elements on the dissolution of oxygen in the metallic phase during the oxidation of titanium alloys. J Mater Sci. 1987;22:1206–1214.10.1007/BF01233110
  • Kitashima T, Liu LJ, Murakami H. Numerical analysis of oxygen transport in alpha titanium during isothermal oxidation. J Electrochem Soc. 2013;160:C441–C444.10.1149/2.100309jes
  • Evans RW, Hull RJ, Wilshire B. The effects of alpha-case formation on the creep fracture properties of the high-temperature titanium alloy IMI834. J Mater Process Technol. 1996;56:492–501.10.1016/0924-0136(96)85109-0
  • Fu Y, et al. Improvement in fretting wear and fatigue resistance of Ti–6Al–4 V by application of several surface treatments and coatings. Surf Coat Technol. 1998;106:193–197.10.1016/S0257-8972(98)00528-3
  • Sonoda T, Kato M. Effects of discharge voltage on Ti-O film formation on Ti-6Al-4 V alloy by reactive DC sputtering. Thin Solid Films. 1997;303:196–199.10.1016/S0040-6090(97)00125-9
  • Kim TS, Park YG, Wey MY. Characterization of Ti-6Al-4 V alloy modified by plasma carburizing process. Mater Sci Eng A. 2003;361:275–280.
  • Shih HD, Jona F. Low-energy electron diffraction and auger electron spectroscopy study of the oxidation of Ti <0001> at room temperature. Appl Phys. 1997;12:311–315.
  • Lu G, Bernasek SL, Schwartz J. Oxidation of a polycrystalline titanium surface by oxygen and water. Surf. Sci. 2000;458:80–90.10.1016/S0039-6028(00)00420-9
  • Kitashima T, Mitarai YY, Iwasaki S, Kuroda S. Effects of alloying elements on the tensile and oxidation properties of alpha and near-alpha Ti alloys. Proc 13th World Conf Titanium John Wiley & Sons, Inc. 2016; p. 479–483.
  • Kitashima T, Kawamura T. Prediction of oxidation behavior of near-α titanium alloys. Scr Mater. 2016;124:56–58.10.1016/j.scriptamat.2016.06.044
  • Chaze AM, Coddet C. Influence of silicon on the oxidation of titanium between 550 and 700 °C. Oxid Met. 1987;27:1–20.10.1007/BF00656726
  • Vojtěch D, Bártová B, Kubatı́k T. High temperature oxidation of titanium–silicon alloys. Mater Sci Eng A. 2003;361:50–57.10.1016/S0921-5093(03)00564-1
  • Schneider J, Ciacchi LC. First principles and classical modeling of the oxidized titanium (0 0 0 1) surface. Surf. Sci. 2010;604:1105–1115.10.1016/j.susc.2010.03.021
  • Ohler B, Prada S, Pacchioni G, Langel W. DFT simulations of titanium oxide films on titanium metal. J Phys Chem C. 2013;117:358–367.10.1021/jp309827u
  • Bhattacharya SK, Sahara R, Kitashima T, Ueda K, Narushima T. First principles study of oxidation of Si segregated α-Ti(0 0 0 1) surfaces. Jpn. J. Appl. Phys. 2017; 56:125701.
  • Kresse G, Furthmüller J. Efficiency of ab initio total energy calculations for metals and semiconductors using a plane-wave basis set. Comput Mater Sci. 1996;6:15–50.10.1016/0927-0256(96)00008-0
  • Kresse G, Furthmüller J. Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set. Phys Rev B. 1996;54:11169–11186.10.1103/PhysRevB.54.11169
  • Blöchl PE. Projector augmented-wave method. Phys Rev B. 1994;50:17953–17979.10.1103/PhysRevB.50.17953
  • Kresse G, Joubert D. From ultrasoft pseudopotentials to the projector augmented-wave method. Phys Rev B. 1999;59:1758–1775.10.1103/PhysRevB.59.1758
  • Perdew JP, Burke K, Ernzerhof M. Generalized gradient approximation made simple. Phys Rev Lett. 1996;77:3865–3868.10.1103/PhysRevLett.77.3865
  • Verlet L. Computer “experiments” on classical fluids. I. Thermodynamical properties of Lennard-Jones molecules. Phys Rev. 1967;159:98–103.10.1103/PhysRev.159.98
  • Verlet L. Computer, “experiments” on classical fluids. II. Equilibrium correlation function. Phys Rev. 1968;165:201–214.
  • Nosé S. A unified formulation of the constant temperature molecular dynamics methods. J Chem Phys. 1984;81:511–519.10.1063/1.447334
  • Bengtsson L. Dipole correction for surface supercell calculations. Phys Rev B. 1999;59:12301–12304.10.1103/PhysRevB.59.12301
  • Ciacchi LC, Payne MC. “Hot-Atom” O2 dissociation and oxide nucleation on Al(1 1 1). Phys Rev Lett. 2004;92:1237.10.1103/PhysRevLett.92.176104
  • Ciacchi LC, Payne MC. First-principles molecular-dynamics study of native oxide growth on Si(0 0 1). Phys Rev Lett. 2005;95:1215.10.1103/PhysRevLett.95.196101
  • Ciacchi LC. Modelling the onset of oxide formation on metal surfaces from first principles. Int J Mater Res. 2007;98:708–716.10.3139/146.101532
  • Zimmermann J, Finnis MW, Ciacchi LC. Vacancy segregation in the initial oxidation stages of the TiN(100) surface. J Chem Phys. 2009;130:134714.10.1063/1.3105992
  • Nichols CS, Van de Walle CG, Pantelides ST. Mechanisms of dopant impurity diffusion in silicon. Phys Rev B. 1989;40:5484–5496.10.1103/PhysRevB.40.5484
  • Lee K-S, Park I-S. Anatase-phase titanium oxide by low temperature oxidation of metallic Ti thin film. Scr Mater. 2003;48:659–663.10.1016/S1359-6462(02)00561-4
  • Wu HH, Trinkle DR. Direct diffusion through interpenetrating networks: oxygen in titanium. Phys Rev Lett. 2011;107:325.10.1103/PhysRevLett.107.045504
  • Wu HH, Trinkle DR. Solute effect on oxygen diffusion in α-titanium. J Appl Phys. 2013;113:223504.10.1063/1.4808283