References
- K. Omura, P. Veluchamy, M. Tsuji, T. Nishio and D. Murojono, J. Electrochem. Soc. 146 (1999) p.2113.
- B. Orel, U. Lavrencic-Stangar and K. Kalcher, J. Electrochem. Soc. 141 (1994) p.L127.
- S.J. Laverty, H. Feng, P. Maguire. J. Electrochem. Soc. 144 (1997) p.2165.
- Z. Hamberg, J.S.E.M. Svesson, T.S. Eriksson, C.G. Granqvist, P. Arrenius and F. Narin, Appl. Opt. 26 (1987) p.2131.
- A.V. Tadeev, G. Delabouglise and M. Labeau, Mater. Sci. Engg. B 57 (1998) p.76.
- K.L. Chopra, S. Major and D.K. Pandya, Thin Solid Films 102 (1983) p.1.
- A.L. Dawar and J.C. Joshi, J. Mater. Sci. 19 (1984) p.1.
- A.J. Freeman, K.R. Poeppelmeier, T.O. Mason, R.P.H. Chang and T.J. Marks, MRS Bull. 25 (2000) p.45.
- D.S. Ginley and C. Bright, MRS Bull. 25 (2000) p.15.
- B.G. Lewis and D.C. Paine, MRS Bull. 25 (2000) p.22.
- Y. Wang, H. Gong, F. Zhu, L. Liu, L. Huang and A.C.H. Huan, Mater. Sci. Eng. B 85 (2001) p.131.
- K. Tonooka, K. Shimokawa and O. Nishimura, Thin Solid Films 411 (2002) p.129.
- H. Kawazoe, M. Yasukawa, H. Hyodo, M. Kurita, H. Yanagi and H. Hosono, Nature 389 (1997) p.939.
- H. Yanagi, H. Kawazoe, A. Kudo, M. Yasukawa and H. Honoso, J. Electroceram. 4 (2000) p.427.
- A. Kudo, H. Yanagi, H. Hosono and H. Kawazoe, Appl. Phys. Lett. 73 (1998) p.220.
- H. Ohta, K.I. Kawamura, M. Orita, M. Hirano and H. Hosono, Electron. Lett. 36 (2000) p.984.
- H. Hiramatsu, K. Ueda, H. Ohta, M. Orita, M. Hirano and H. Hosono, Thin Solid Films 411 (2002) p.125.
- T. Yamamoto H. Katayama-Yoshida, Japan. J. Appl. Phys. Part 2: Lett. 38L (1999). p. 166
- M. Joseph, H. Tabata, H. Saeki, K. Ueda and T. Kawai, Physica B 302 (2001) p.140.
- H. Ohta, K.I. Kawamura, M. Orita and M. Hirano, Appl. Phys. Lett. 77 (2000) p.475.
- M.K. Jayaraj, A.D. Draeseke, J. Tate, R.L. Hoffman and J.F. Wager, Mater. Res. Soc. Symp. Proc. 666 (2001) p. F311.
- K.L. Narayanan, R. Rajaraman, M.C. Valsakumar, K.G.M. Nair and K.P. Vijayakumar, Mater. Res. Bull. 34 (1999) p.1729.
- D.B. Buchholz, D.E. Proffit, M.D. Wisser, T.O. Mason and R.P.H. Chang, Prog. Nat Sci: Mat. Int. 22 (2012) p.1.
- K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano and H. Hosono, Nature 432 (2004) p.488.
- W.M. Kim, D.Y. Ku, I.K. Lee, Y.W. Seo, B.K. Cheong, T.S. Lee, I.H. Kim and K.S. Lee, Thin Solid Films 473 (2005) p.315.
- M. Warasawa, A. Kaijo and M. Sugiyama, Thin Solid Films 520 (2012) p.2119.
- C. Xu, J. Tamaki, N. Miura and N. Yamazoe, Talanta 38 (1991) p.1169.
- M. Mohagheghi and M. Saremi, J. Phys. D: Appl. Phys. 37 (2004) p.1248.
- S.K. Sinha, T. Rakshit and S.K. Ray, I. Manna, Appl. Surf. Sci. 257 (2011) p.10551.
- Sk.F. Ahmed, S. Khan, P.K. Ghosh, M.K. Mitra, K.K. Chattopadhyay, J. Sol-Gel. Sci. Techn. 39(2006) p. 241.
- S.K. Sinha, R. Bhattacharya, S.K. Ray and I. Manna, Mater. Lett. 65 (2011) p.146.
- B. B. Straumal, S.G. Protasova, A.A. Mazilkin, T. Tietze E. Goering, G. Schütz, P.B. Straumal, B. Baretzky, J. Beilstein Nanotechnology 4 (2013) p. 361.
- B.B. Straumal, S.G. Protasova, A.A. Mazilkin, G. Schütz, E. Goering, B. Baretzky and P.B. Straumal, J. Exp. Theor. Phys. Lett. 97 (2013) p.367.
- J.I. Pankove, Optical Processes in Semiconductors, Dover, New York, 1971.
- E. Burstein, Phys. Rev. 93 (1954) p.632.
- T.S. Moss, Proc. Phys. Soc. London. 67 (1954) p.775.
- J. Pal and P. Chauhan, Mater. Charact. 60 (2009) p.1512.
- G. Haacke, J. Appl. Phys. 47 (1976) p.4086.
- K.L. Chopra, Thin Film Phenomena, McGraw-HillNew York, 1969.
- C. Xu, J. Tamaki, N. Miura and N. Yamazoe, Talanta 38 (1991) p.1169.
- A.J. Freeman, K.R. Poeppelmeier, T.O. Mason, R.P.H. Chang and T.J. Marks, MRS Bull 25 (2000) p.45.
- Z.M. Jarzebski and J.P. Morton, J. Electrochem. Soc. 123 (1976) p.299.
- S. Samson and C.G. Fonstad, J. Appl. Phys. 44 (1973) p.4618.
- N.F. Mott, J. Non-Cryst. Solids 1 (1968) p.1.
- K.S. Ramaiah and V.S. Raja, Appl. Surf. Sci. 253 (2006) p.1451.
- M. Benhaliliba, C.E. Benouis, Y.S. Ocak and F. Yakuphanoglu, J. Nano – Electron. Phys 4 (2012) p.01011.