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Journal of Information Display Volume 12, 2011 - Issue 1
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Articles

Highly stable amorphous indium–gallium–zinc-oxide thin-film transistor using an etch-stopper and a via-hole structure

M. Mativenga Advanced Display Research Center, Kyung Hee University, Seoul, 130-701, Republic of Korea
,
J. W. Choi Advanced Display Research Center, Kyung Hee University, Seoul, 130-701, Republic of Korea
,
J. H. Hur Advanced Display Research Center, Kyung Hee University, Seoul, 130-701, Republic of Korea
,
H. J. Kim Advanced Display Research Center, Kyung Hee University, Seoul, 130-701, Republic of Korea
&
Jin Jang Advanced Display Research Center, Kyung Hee University, Seoul, 130-701, Republic of KoreaCorrespondence[email protected]
Pages 47-50 | Received 21 Oct 2010, Accepted 22 Nov 2010, Published online: 16 Mar 2011

References

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