Area-selective atomic layer deposition of Al₂O₃ using inkjet-printed inhibition patterns and lift-off process

Jun Ho Yua Digital Transformation R&D Department, Korea Institute of Industrial Technology, Cheonan-si, South KoreaView further author information

Young–In Choa Digital Transformation R&D Department, Korea Institute of Industrial Technology, Cheonan-si, South Korea;b Department of Material Engineering, Han–yang University, Seoul, South KoreaView further author information

Jae–Wook Leec Department of Mechatronics Engineering, Jeju University, Jeju-si, South KoreaView further author information

Kyung Hyun Choic Department of Mechatronics Engineering, Jeju University, Jeju-si, South KoreaView further author information

Sang–Ho Leea Digital Transformation R&D Department, Korea Institute of Industrial Technology, Cheonan-si, South KoreaCorrespondence[email protected]
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Pages 215-225 | Received 31 Oct 2022, Accepted 24 Feb 2023, Published online: 19 Mar 2023

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https://doi.org/10.1080/15980316.2023.2189079
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Area-selective atomic layer deposition of Al₂O₃ using inkjet-printed inhibition patterns and lift-off process