Stability conditions and robustness analysis of a general MMSE run-to-run controller

References

• Box, G.E.P., Jenkins, G.M. and Reinsel, G.C. (1994) Time Series Analysis, Forecasting and Control, third edition, Prentice Hall, Englewood Clifs, NJ.
   Google Scholar
• Butler, S.W. and Stefani, J.A. (1994) Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry. IEEE Transactions on Semiconductor Manufacturing, 7, 193–201.
   Web of Science ®Google Scholar
• Capilla, C., Ferrer, A., Romero, R. and Hualda, A. (1999) Integration of statistical and engineering process control in a continuous polymerization process. Technometrics, 41, 14–28.
   Web of Science ®Google Scholar
• Chen, A. and Guo, R.S. (2001) Age-based double EWMA controller and its application to CMP processes. IEEE Transactions on Semiconductor Manufacturing, 14, 11–19.
   Web of Science ®Google Scholar
• Del Castillo, E. (1999) Long run and transient analysis of a double EWMA feedback controller. IIE Transactions, 31, 1157–1169.
   Web of Science ®Google Scholar
• Del Castillo, E. (2001) Some properties of EWMA feedback quality adjustment schemes for drifting disturbances. Journal of Quality Technology, 33, 153–166.
   Web of Science ®Google Scholar
• Del Castillo, E. (2002) Statistical Process Adjustment for Quality Control, Wiley-Interscience, New York, NY.
   Google Scholar
• Fan, S.K.S., Jiang, B.C., Jen, C.H. and Wang, C.C. (2002) SISO run-to-run feedback controller using triple EWMA smoothing for semiconductor manufacturing processes. International Journal of Production Research, 40, 3093–3120.
   Web of Science ®Google Scholar
• Hamby, E.S., Kabamba, P.T. and Khargonekar, P.P. (1998) A probabilistic approach to run-to-run control. IEEE Transactions on Semiconductor Manufacturing, 11, 654–669.
   Web of Science ®Google Scholar
• Ingolfsson, A. and Sachs, E. (1993) Stability and sensitivity of an EWMA controller. Journal of Quality Technology, 25, 271–287.
   Web of Science ®Google Scholar
• Jen, C.H. and Jiang, B.C. (2008) Combining on-line experiment and process control methods for changes in a dynamic model. International Journal of Production Research, 46, 3665–3682.
   Web of Science ®Google Scholar
• Lin, C.H., Tseng, S.T. and Wang, S.F. (2013) Modified EWMA controller subject to metrology delay. IIE Transactions, 45(4), 409–421.
   Web of Science ®Google Scholar
• Moyne, J., Solakhian, V., Yershov, A., Anderson, M. and Mockler-Hebert, D. (2002) Development and deployment of a multi-component advanced process control system for an epitaxy tool, in Proceedings of the IEEE/SEMI Conference and Workshop on Advanced Semiconductor Manufacturing, Semiconductor Equipment and Materials International (SEMI), San Jose, CA, pp.125–130.
   Google Scholar
• Myers, R.H., Montgomery, D.C. and Anderson-Cook, C.M. (2009) Response Surface Methodology, Wiley, New York, NY.
   Google Scholar
• Pan, R. and del Castillo, E. (2001) Identification and fine tuning of closed-loop processes under discrete EWMA and PI adjustments. Quality and Reliability Engineering International, 17, 419–427.
   Web of Science ®Google Scholar
• Qiu, P. and Xiang, D. (2014) Univariate dynamic screening system: An approach for identifying individuals with irregular longitudinal behavior. Technometrics, 56, 248–260.
   Web of Science ®Google Scholar
• R Development Core Team (2013) R: A language and environment for statistical computing. http://www.R-project.org.
   Google Scholar
• Sachs, E., Hu, A. and Ingolfsson, A. (1995) Run by run process control: Combining SPC and feedback control. IEEE Transactions on Semiconductor Manufacturing, 8, 26–43.
   Web of Science ®Google Scholar
• Tseng, S.T. and Chen, P.Y. (2017) A generalized quasi-MMSE controller for run-to-run dynamic models. Technometrics, 59(3), 381–390.
   Web of Science ®Google Scholar
• Tseng, S.T., Chou, R. J. and Lee, S.P. (2002) Statistical design of double EWMA controller. Applied Stochastic Models in Business and Industry, 18, 313–322.
   Google Scholar
• Tseng, S.T. and Hsu, N. J. (2005) Sample size determination for achieving the asymptotic stability of dEWMA controller. IEEE Transactions on Semiconductor Manufacturing, 18(1), 104–111.
   Google Scholar
• Tseng, S.T. and Lin, C.H. (2009) Stability analysis of single EWMA controller under dynamic models. IIE Transactions, 41, 654–663.
   Web of Science ®Google Scholar
• Tseng, S.T. and Mi, H.C. (2014) Quasi-minimum mean square error run-to-run controller for dynamic models. IIE Transactions, 46(2), 185–196.
   Web of Science ®Google Scholar
• Tseng, S.T., Mi, H.C. and Lee, I.C. (2016) A multivariate EWMA controller for linear dynamic processes. Technometrics, 58(1), 104–115.
   Web of Science ®Google Scholar
• Tseng, S.T., Yeh, A.B., Tsung, F. and Chan, I.Y. (2003) A study of variable EWMA controller. IEEE Transactions on Semiconductor Manufacturing, 16(4), 633–643.
   Web of Science ®Google Scholar
• Tsung, F., Wu, H. and Nair, V.N. (1998) On efficiency and robustness of discrete proportional-integral control schemes. Technometrics, 40, 214–222.
   Web of Science ®Google Scholar