References
- Kogelschatz U: ‘Dielectric-barrier discharges: their history, discharge physics, and industrial applications’, Plasma Chem. Plasma Process., 2003, 23, 1–46.
- Fridman A, Chirokov A, Gutsol A: ‘Non-thermal atmospheric pressure discharges’, J. Phys. D: Appl. Phys., 2005, 38, R1–R24.
- d’Agostino R, Cramarossa F, Fracassi F, Illuzzi F: ‘Plasma polymerization of fluorocarbons’, in ‘Plasma deposition, treatment and etching of polymers’, (ed. , d’Agostino R, ed), 95–162; 1990, New York, Academic Press.
- d’Agostino R:‘PE-CVD of polymer films: mechanisms, chemistry and diagnostics’ in ‘Plasma processing of polymers’(, d’Agostino, et al..), NATO ASI Series E: Applied Science, Vol. 346, 3–46; 1997, Dordrecht, Kluwer Academic Publishers.
- Fracassi F, Occhiello E, Coburn JW: ‘Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films’, J. Appl. Phys., 1987, 62, 3980–3981.
- Egitto FD: ‘Plasma etching and modification of organic polymers’, Pure Appl. Chem., 1990, 62, 1699–1708.
- Yokoyama T, Kogoma M, Kanazawa S, Moriwaki T, Okazaki S: ‘The improvement of the atmospheric pressure glow plasma method and the deposition of organic films’, J. Phys. D: Appl. Phys., 1990, 23, 374–377.
- Vinogradov IP, Dinkelmann A, Lunk A,: ‘Measurement of the absolute CF2 concentration in a dielectric barrier discharge running in argon/fluorocarbon mixtures’, J. Phys. D: Appl. Phys., 2004, 27, 3000–3007.
- Vinogradov IP, Lunk A: ‘Spectroscopic diagnostics of DBD in Ar/fluorocarbon mixtures – correlation between plasma parameters and properties of deposited polymer films’, Plasma Processes Polym., 2005, 2, 201–208.
- Fanelli F, d’Agostino R, Fracassi F: ‘Atmospheric pressure PE-CVD of fluorocarbon thin films by means of glow dielectric barrier discharges’, Plasma Processes Polym., 2007, 4, 797–805.
- Fanelli F, Di Renzo G, Fracassi F, d’Agostino R: ‘Recent advances in the atmospheric pressure PECVD of fluorocarbon films from glow dielectric barrier discharges: influence of air and water vapour impurities’, Plasma Processes Polym., 2009, 6, S503–S507.
- Fanelli F, Fracassi F, d’Agostino R: ‘Deposition and etching of fluorocarbon thin films in atmospheric pressure DBDs fed with Ar–CF4–H2 and Ar–CF4–O2 mixtures’, Surf. Coat. Technol., 2010, 204, 1779–1784.
- Fanelli F: ‘Thin film deposition and surface modification with atmospheric pressure dielectric barrier discharges’, Surf. Coat. Technol., 2010, 206, 1536–1543.