References
- Kang JW, Jeong WI, Kim JJ, Kim HK, Kim DG and Lee GH: Solid State Lett., 2007, 10, J75.
- Oh BY, Jeong MC, Moon TH, Lee W, Myoung JM, Hwang JY and Seo DS: J. Appl. Phys., 2006, 99, 124505.
- Matsubara K, Fons P, Iwata K, Yamada A, Sakurai K, Tampo H and Niki S: Thin Solid Films, 2003, 431, 369.
- Cao HT, Sun C, Pei ZL, Wang AY, Wen LS, Hong RJ and Jiang X: J. Mater. Sci.: Mater. Electron., 2004, 15, 169.
- Shih NF, Lin CC and Kung CY: Jpn J. Appl. Phys., 2013, 52, 01AC07.
- Zhang MY and Cheng GJ: Appl. Phys. Lett., 2011, 99, 051904.
- Girtan M, Vlad A, Mallet R, Bodea MA, Pedarnig JD, Stanculescu A, Mardare D, Leontie L and Antohe S: Appl. Surf. Sci., 2013, 274, 306.
- Kluth O, Schöpe G, Rech B, Menner R, Oertel M, Orgassa K and Schock HW: Thin Solid Films, 2006, 502, 311.
- Chen M, Pei ZL, Wang X, Sun C and Wen LS: J. Mater. Sci. Technol. A, 2001, 19A, 963.
- Szyszka B: Thin Solid Films, 1999, 351, 164.
- Rim YS, Kim SM, Choi HW, Park SJ and Kim KH: Colloids Surf. A, 2008, 313A–314A, 461.
- Chen M, Wang X, Yu YH, Pei ZL, Bai XD, Sun C, Huang RF and Wen LS: Appl. Surf. Sci., 2000, 158, 134.
- Minami T: Semicond. Sci. Technol., 2005, 20, S35.
- Kim H, Piqu A, Horwitz JS, Murata H, Kafafi ZH, Gilmore CM and Chrisey DB: Thin Solid Films, 2000, 377–378, 798.
- Liu JS, Shan CX, Wang SP, Li BH, Zhang ZZ and Shen DZ: J. Cryst. Growth, 2012, 347, 95.
- Berginski M, Hüpkes J, Schulte M, Schöpe G, Stiebig H and Rech B: J. Appl. Phys., 2007, 101, 074903.
- Houng B, Huang CL and Tsai SY: J. Cryst. Growth, 2007, 307, 328.
- Burstein E: Phys. Rev., 1954, 93, 632.
- Moss TS: Proc. Phys. Soc. B, 1954, 67B, 775.
- Yamamoto A, Miyajima K, Goto T, Hang J and Yao T: J. Appl. Phys., 2001, 90, 4973.
- Shan FK and Yu YS: J. Eur. Ceram. Soc., 2004, 24, 1869.
- Yousefi R and Jamali-Sheini F: Ceram. Int., 2012, 38, 5821.
- Yang J, Gao M, Yang L, Zhang Y, Lang J, Wang D, Wang Y, Liu H and Fan H: Appl. Surf. Sci. 2008, 255, 2646.
- Yousefi R, Jamali-Sheini F, Khorsand Zak A and Mahmoudian MR: Ceram. Int., 2012, 38, 6295.