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Sputtering deposition process of perovskite Pb—Ti—O3 families

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Pages 343-356 | Received 30 Jun 1991, Published online: 10 Feb 2011
 

Abstract

This paper describes the basic deposition process of the perovskite Pb-Ti-O3 families. Experimental results have been reviewed for the sputtering deposition of the PbTiO3 and (Pb,La)(Zr,Ti)O3 thin films, and the dielectric properties are discussed for the epitaxially grown single crystalline films and the amorphous ones in relation to their ferroelectricity.

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