Design and application of multiwafer MOCVD systems for ferroelectrics

Abstract

Metalorganic chemical vapor deposition (MOCVD) has been established as the most favoured method for the processing of (Ba, Sr)TiO₃, Pb(Zr, Ti)O₃ and SrBi₂Ta₂O₉ thin films. Due to good step coverage, uniformity of thickness and composition as well as throughput MOCVD will certainly be the choice for the mass production of future electroceramic thin film based devices such as volatile and non-volatile memories, electrooptic devices, microactuators and sensors. Since many groups showed in a laboratory scale that electroceramic thin films deposited by MOCVD techniques are suitable for future applications in terms of electrical and mechanical properties, the need for production worthy tools is rapidly increasing.

In this paper we present a large scale manufactor tool (capacity up to 4 × 300 mm) which meets all demands for an automized mass production of electroceramic thin films.

Key Words:

• MOCVD
• BST
• PZT
• SBT
• multiwafer manufactor tool