The role of nickel addition and annealing temperature on ion storage performance of nanostructured nickel ferrite thin films

Abstract

The sol–gel spin-coated nickel ferrite (NF), NiFe₂O₄, thin films were synthesised and the effect of annealing temperature and compositional ratio on different properties of samples were investigated. Electrochemical performance of the films was measured in the presence of KOH and LiClO₄/PC electrolyte. Generally, addition of nickel increases the current density. The NF thin films with molar ratio of 0.5 and annealed at 400 °C have the highest charge density value and the highest capacitance in both electrolytes. Annealing temperature had significant effect on electrochemical properties of NF thin films and the diffusion coefficient enhanced by increasing the annealing temperature. X-ray diffraction patterns of prepared samples showed the rhombohedral structure, hematite phase (α-Fe₂O₃), of iron oxide sample and the presence of inverse spinel structure confirms the formation of NF. Field emission scanning electron microscopy images revealed that the morphology of films changes from larvae shape to granular structure by nickel incorporation and the grain size increased by raising the annealing temperature. The absorption edge of the hematite shift to higher wavelength by annealing and nickel incorporation and band gap narrowing has been occurred.

Keywords:

• Ferrite
• thin films
• electrochemical
• annealing

Acknowledgement

The authors gratefully acknowledge Prof. M. Arvand and employers of electrochemistry lab for CV measurements and the University of Guilan Research Council for the support of this work.