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Abstract
The novel photopolymers having photoreactive pendant group were designed and synthesized through the reaction between precursor, poly(methacrylic acid-co-2-hydroxyethyl methacrylate-co-styrene)(poly(MAA-HEMA-STY)) and photoreactive compounds such as methacryloyl chloride (MAC), cinnamoyl chloride (CC), methacryloyl isocyante (MAI) and 3-isopropenyl-α, α-dimethylbenzyl isocyanate (TMI), respectively. The prepared poly(MAA-HEMA-STY) and novel photopolymers were characterized by 1H-NMR and FT-IR spectroscopy.
The photosensitivity of photopolymers was estimated with the UV exposing time by FT-IR spectra change at 1630 cm−1. The photosensitivity of photoresists was determined by calculating the UV energy at the pattern-remaining step after developing the thin film using gray-scale mask. In connection with the photosensitivity the surface hardness and compression properties of photopolymer films were determined by nano indenter. All prepared photopolymers revealed higher surface hardness than poly(MAA-HEMA-STY). Photopolymers with methacryloyl functional side group showed better photosensitivity than photopolymers with vinyl aromatic and cinnamoyl group. Especially photopolymer prepared from poly(MAA-HEMA-STY) and MAI showed good potential for the application of negative-working photoresist.
Acknowledgments
The Korea Science and Engineering Foundation through the Hyperstructured Organic Materials Research Center supported this work. We acknowledge this support with thanks.
Notes
1)For photopolymer.
2)For photoresist.
