Modeling of low-temperature plasma inhibition and mechanism of Aspergillus flavus on corn kernels surface

ABSTRACT

This study was conducted to optimize a process of low-temperature plasma treatment for the decontamination of Aspergillus flavus (A. flavus) on corn kernels. Impacts of plasma-treated time (30, 60, 90 s), plasma-treated power (300, 400, 500 W), and vacuum degree (85, 90, 95 Pa) on the decontamination effect in this process were explored. The optimal conditions included vacuum degree at 90 Pa, plasma treating time of 90 s, and plasma treating power of 500 W, under which the A. flavus spores was 4.03 log (cfu/g). Plasma treatment triggered antioxidative defense system, broke cell structures, and dispersed cell contents. A large number of free radicals act on lipids and proteins, and malondialdehyde (MDA) accumulate in large quantities, further leading to damage to cell structures.

KEYWORDS:

• Low-temperature plasma
• corn kernels
• decontamination
• morphology
• Aspergillus flavus

Author contributions

Shuai Li and Jingxin Song designed the study. Shuai Li collected test data and drafted the manuscript. Haiyang Zou and Mo Niu performed the data analyses. Yingnan Zeng approved the final version.

Disclosure statement

We declare that we have no financial and personal relationships with other people or organizations that can inappropriately influence our work, there is no professional or other personal interest of any nature or kind in any product, service and/or company that could be construed as influencing the position presented in, or the review of, the manuscript entitled.

Additional information

Funding

This work was supported by the Doctoral Fund Project in Jilin Agriculture Science and Technology University [No. 20215017]; National Key R&D Program of China [No. 2022YFF1103300]; the Science and Technology Project in Jilin Provincial Department of Education [No. JJKH20230438KJ]. Food Science and Engineering School level Key Discipline of Jilin Agriculture Science and Technology University.