Advanced search
Publication Cover
Materials Research Innovations Volume 19, 2015 - Issue sup5: Global Conference on Materials Science and Engineering (CMSE 2014)
Submit an article Journal homepage
54
Views
1
CrossRef citations to date
0
Altmetric
Research Papers

Composition and residual stress analysis of Ti-Si/(Ti-Si)xN film on Mg–Al alloy substrate prepared by magnetron sputtering

H. T. Li
,
T. WangResearch Center of Metal Wear Resistance and Surface Technology EngineeringMinistry of Education, Jiamusi University, Jiamusi154007, China
&
Q. WangKey Laboratory of Automobile MaterialsMinistry of Education, College of Material Science and Engineering, Jilin University, Changchun130022, ChinaCorrespondence[email protected]
Pages S5-1268-S5-1271 | Received 20 Oct 2014, Accepted 18 Dec 2014, Published online: 30 May 2015
 
Sample our Physical Sciences journals, sign in here to start your FREE access for 14 days

Abstract

Chemical composition, residual stress and crystalline phase of Ti-Si/(Ti-Si)xN films were investigated with X-ray fluorescence and X-ray diffraction, respectively. The results reveal that the TiN phase has a preferential orientation along the crystalline plane (111). The residual stress in films is tensile stress, and the minimum stress reaches about 103 MPa under the deposition parameters of negative bias being 80 V and Ar/N2 flux ratio being 11/4. The element content decreases sharply with the negative bias greater than 80 V and Ar/N2flux ratio greater than 11/4. The composition and residual stress in the film can be controlled effectively by reasonably selecting fabrication parameters.

Reprints and Corporate Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

To request a reprint or corporate permissions for this article, please click on the relevant link below:

Order Reprints Request Corporate Permissions

Academic Permissions

Please note: Selecting permissions does not provide access to the full text of the article, please see our help page How do I view content?

Obtain permissions instantly via Rightslink by clicking on the button below:

Request Academic Permissions

If you are unable to obtain permissions via Rightslink, please complete and submit this Permissions form. For more information, please visit our Permissions help page.

Related Research Data

Formation by reactive magnetron sputtering of TiN coating on Ti-implanted magnesium alloy
Source: Elsevier BV
Determination of residual stress in PZT films produced by laser ablation with X-ray diffraction and Raman spectroscopy
Source: Elsevier BV
Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias
Source: Elsevier BV
Abnormal residual stress in nanostructured Al thin films grown on Ti/glass substrates
Source: Elsevier BV
A simple method for residual stress measurements in thin films by means of focused ion beam milling and digital image correlation
Source: Elsevier BV
Modeling of residual stresses in thin films deposited by electron beam evaporation
Source: Elsevier BV
Preparation and characterization of ceramic/metal duplex coatings deposited on AZ31 magnesium alloy by multi-magnetron sputtering
Source: Elsevier BV
Effects of heat treatment on microstructure and mechanical properties of ZK60 Mg alloy
Source: Elsevier BV
Residual stress analysis of TiN film fabricated by plasma immersion ion implantation and deposition process
Source: Elsevier BV
Evaluation on residual stresses of silicon-doped CVD diamond films using X-ray diffraction and Raman spectroscopy
Source: Elsevier BV

Linking provided by 

Related research

People also read lists articles that other readers of this article have read.

Recommended articles lists articles that we recommend and is powered by our AI driven recommendation engine.

Cited by lists all citing articles based on Crossref citations.
Articles with the Crossref icon will open in a new tab.