High deposition rate magnetrons: key elements and advantages

Abstract

An innovative coating technology based on ion plasma magnetron sputtering physical vacuum deposition (IMPS-PVD) method has been developed to produce new complex coatings to meet the constantly growing demand of advanced industries, with a view to replacing chemical coating methods owing to their ecology danger and to complement/replace high temperature PVD methods. The high deposition rate magnetron (HDRM) technology has initiated a rebirth of mosaic targets as the key component leading to a big increase in the design accuracy of both targets and coatings to be deposited.

Keywords:

• HIGH DEPOSITION RATE MAGNETRONS
• SPUTTERING
• VACUUM DEPOSITION
• ION PLASMA