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Abstract
Abstract
Indium tin oxide (ITO) ceramic sputtering targets used for the manufacturing of transparent conductive thin films for electrodes in flat panel displays, solar cells, touch panels, antistatic films and others developed and commercially produced are described. Thanks to optimised compositions and developed technology, commercially producing large size planar and new generation rotary ceramic target components have high density (up to 99·5% of theoretical density), uniform microcrystalline structure and superior properties, e.g. low electrical resistivity. As a result, nanosized thin films produced by direct current magnetron sputtering from the developed targets have uniform nanocrystalline or amorphous structures and superior transmittance (>90%) and low electrical resistivity. The morphology and properties of these films have been studied, depending on the film processing features. The benefits of the developed ITO rotary targets for industrial nanosized film processing (e.g. significant increase in process efficiency, about three times higher target utilisation, practically no nodule formation and particle redeposition during sputtering and reduced processing cost) are outlined.
The assistance of Fraunhofer Institute for Thin Films and Surface Technology, FhG-IST Braunschweig (Germany), is greatly appreciated for the performance of XRD and high resolution SEM analysis of thin films.