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Ferroelectrics Volume 575, 2021 - Issue 1
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Research Article

Features of the structure formation of PZT thin films by reactive plasma sputtering

V. V. PetrovInstitute of Nanotechnologies, Electronics, and Equipment Engineering, Southern Federal University, Taganrog, RussiaView further author information
,
Yu. N. VarzarevInstitute of Nanotechnologies, Electronics, and Equipment Engineering, Southern Federal University, Taganrog, RussiaCorrespondence[email protected]
View further author information
,
A. V. NesterenkoInstitute of Nanotechnologies, Electronics, and Equipment Engineering, Southern Federal University, Taganrog, RussiaView further author information
&
I. N. KotsInstitute of Nanotechnologies, Electronics, and Equipment Engineering, Southern Federal University, Taganrog, RussiaView further author information
Pages 140-143 | Received 17 Aug 2020, Accepted 30 Dec 2020, Published online: 26 May 2021

Citations (3)

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Read on this site (2)

V. V. Petrov, A. V. Nesterenko & M. V. Il’ina. (2022) Study of the properties of a PZT thin film formed on a highly doped silicon substrate. Ferroelectrics 592:1, pages 58-63.
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V. V. Petrov, A. V. Nesterenko, D. V. Stryukov & A. V. Pavlenko. (2022) Study of the electrical properties of a PZT thin film formed on a metal substrate. Ferroelectrics 591:1, pages 84-90.
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Articles from other publishers (1)

I.A. Gulyaeva, A.V. Nesterenko, D.V. Stryukov, A.V. Pavlenko, M.V. Il'ina, O.A. Ageev & V.V. Petrov. (2022) Study of the vertically oriented domain structure of nanosized PZT films. Materials Today: Proceedings 52, pages 195-198.
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