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Radiation Effects Volume 79, 1983 - Issue 1-4
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Original Articles

Range and spatial distribution of ion-implanted impurities in glasses

A. A. Deshkovskaya Minsk Radiotechnical Institute, USSR
,
A. F. Burenkov Minsk Radiotechnical Institute, USSR; Institute of Applied Physics Problems, Belorussian State University, USSR
&
F. F. Komarov Minsk Radiotechnical Institute, USSR; Institute of Applied Physics Problems, Belorussian State University, USSR
Pages 241-244 | Received 21 Apr 1983, Published online: 19 Aug 2006

Citations (5)

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Read on this site (1)

A.A. Deshkovskaya. (1987) Ion implantation in glasses and concomitant effects. Radiation Effects 103:1-4, pages 149-156.
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Articles from other publishers (4)

Wang Ke-Ming, Shi Bo-Rong, Guo Hai-Yan, Liu Ji-Tian & Liu Xiang-Dong. (1990) Range profiles of 50 to 400 keV xenon ions in a silicate glass. Journal of Physics D: Applied Physics 23:7, pages 867-869.
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Ke-Ming Wang, Xi-Ju Liu, Yi-Hua Wang, Bo-Rong Shi & Ji-Tian Liu. (1988) Mean projected range and range straggling of 50- to 400-keV Hg+ in glass. Journal of Applied Physics 64:7, pages 3341-3344.
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Ke-Ming Wang, Xi-Ju Liu, Yi-Hua Wang, Ji-Tian Liu, Hai-Yan Guo & Bo-Rong Shi. (1987) Range profiles of 50 to 400 keV Hg+ in quartz crystal. Physics Letters A 125:8, pages 399-402.
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Wang Ke-Ming, Wang Yi-Hua, Tan Chun-Yu, Liu Ji-Tian, Liu Xi-Ju & Shi Be-Rong. (1987) Analysis of bromine ion range distributions in glass. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 19-20, pages 938-942.
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