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Chemical Engineering Communications Volume 190, 2003 - Issue 3
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Original Articles

Synthesis and characterization of boron carbide films by plasma-enhanced chemical vapor deposition

Ö. D. Eroğlu Department of Chemical Engineering, Middle East Technical University, Ankara, Turkey
,
N. A. Sezgi Department of Chemical Engineering, Middle East Technical University, Ankara, Turkey
,
H. ö. Özbelge Department of Chemical Engineering, Middle East Technical University, Ankara, Turkey
&
H. H. Durmazuçar Department of Chemical Engineering, Cumhuriyet University, Sivas, Turkey
Pages 360-372 | Published online: 09 Sep 2010

Citations (3)

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Read on this site (1)

Rong Tu, Xuan HU, Jun Li, Meijun Yang, Qizhong Li, Ji Shi, Haiwen Li, Hitoshi Ohmori, Takashi Goto & Song Zhang. (2020) Fabrication of (a-nc) boron carbide thin films via chemical vapor deposition using ortho-carborane. Journal of Asian Ceramic Societies 8:2, pages 327-335.
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Articles from other publishers (2)

P. G. Sennikov, R. A. Kornev & A. I. Shishkin. (2017) Preparation of Boron Carbide from BF3 and BCl3 in Hydrogen Plasma of Arc RF Discharge. Plasma Chemistry and Plasma Processing 37:4, pages 997-1008.
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Yan Liu, Kehe Su, Qingfeng Zeng, Laifei Cheng & Litong Zhang. (2012) Reaction paths of BCl3 + CH4 + H2 in the chemical vapor deposition process. Structural Chemistry 23:6, pages 1677-1692.
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