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Original Articles

SELECTIVE REMOVAL OF HIGH-K GATE DIELECTRICS

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Pages 1475-1535 | Published online: 04 Sep 2009

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Jewon Park, Jae Ho Choi, Hyein Na & Hyeong-Jun Kim. (2021) Effect of CaF2 on fluorocarbon plasma resistance and thermal properties of CaO-Al2O3-SiO2 glasses. Journal of Asian Ceramic Societies 9:1, pages 334-340.
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Articles from other publishers (30)

Young Min Byun, Jae Ho Choi, Won Bin Im & Hyeong-Jun Kim. (2024) Analysis of plasma etching reactivity of bismuth aluminosilicate glasses using fluorine concentration. Journal of Non-Crystalline Solids 629, pages 122883.
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R. Midahuen, B. Previtali, C. Fontelaye, G. Nonglaton, V. Stambouli & S. Barraud. (2021) Wafer-scale fabrication of biologically sensitive Si nanowire FET: from pH sensing to electrical detection of DNA hybridization. Wafer-scale fabrication of biologically sensitive Si nanowire FET: from pH sensing to electrical detection of DNA hybridization.
R. Midahuen, B. Previtali, C. Fontelaye, G. Nonglaton, S. Barraud & V. Stambouli. (2021) Wafer-scale fabrication of biologically sensitive Si nanowire FET: from pH sensing to electrical detection of DNA hybridization. Wafer-scale fabrication of biologically sensitive Si nanowire FET: from pH sensing to electrical detection of DNA hybridization.
Hyeon-Myeong Oh, Young-Jo Park, Ha-Neul Kim, Kundan Kumar, Jae-Woong Ko, Chae-Eon Lee & Hyun-Kwuon Lee. (2021) Remarkable plasma-resistance performance by nanocrystalline Y2O3·MgO composite ceramics for semiconductor industry applications. Scientific Reports 11:1.
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Ju Eun Kim, Doo San Kim, You Jung Gill, Yun Jong Jang, Ye Eun Kim, Hanna Cho, Bok-Yeon Won, Oik Kwon, Kukhan Yoon, Jin-Young Choi, Jea-Gun Park & Geun Young Yeom. (2020) Etch characteristics of magnetic tunnel junction materials using H 2 /NH 3 reactive ion beam . Nanotechnology 32:5, pages 055301.
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Kang-Yi Lin, Chen Li, Sebastian Engelmann, Robert L. Bruce, Eric A. Joseph, Dominik Metzler & Gottlieb S. Oehrlein. (2020) Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 38:3.
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Melanie Jenkins, Dustin Z. Austin, John F. ConleyJr.Jr., Junqing Fan, C. H. de Groot, Liudi Jiang, Ye Fan, Rizwan Ali, Gargi Ghosh, Marius Orlowski & Sean W. King. (2019) Review—Beyond the Highs and Lows: A Perspective on the Future of Dielectrics Research for Nanoelectronic Devices. ECS Journal of Solid State Science and Technology 8:11, pages N159-N185.
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A. V. Myakonkikh, K. Yu. Kuvaev, A. A. Tatarintsev, N. A. Orlikovskii, K. V. Rudenko, O. P. Guschin & E. S. Gornev. (2018) Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension. Russian Microelectronics 47:5, pages 323-331.
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Richa Padhye, Adelia J. A. Aquino, Daniel Tunega & Michelle L. Pantoya. (2017) Fluorination of an Alumina Surface: Modeling Aluminum–Fluorine Reaction Mechanisms. ACS Applied Materials & Interfaces 9:28, pages 24290-24297.
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Shailesh Dhungana, Thuong D. Nguyen, Bradley J. Nordell, Anthony N. Caruso, Michelle M. Paquette, Georges Chollon, William A. Lanford, Kris Scharfenberger, Danya Jacob & Sean W. King. (2017) Boron and high- k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing . Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35:2.
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Jae Ho Choi, Yoon Soo Han, Sung Min Lee, Hyung Bin Park, Sung Churl Choi & Hyeong Jun Kim. (2016) mCharacteristics of Carbon Tetrafluoride Plasma Resistance of Various Glasses. Journal of the Korean Ceramic Society 53:6, pages 700-706.
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Young-Uk Ko, Ho-Jin Yun, Kwang-Seok Jeong, Yu-Mi Kim, Seung-Dong Yang, Seong-Hyeon Kim, Jin-Sup Kim, Jin-Un An, Hi-Deok Lee & Ga-Won Lee. (2016) Current–voltage and low-frequency noise analysis of heterojunction diodes with various passivation layers. Thin Solid Films 598, pages 109-114.
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Xiaofeng Wang & Michael Goryll. (2015) Nanopore patterning using Al 2 O 3 hard masks on SOI substrates . Journal of Micromechanics and Microengineering 25:7, pages 075020.
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V. Paraschiv, W. Boullart & E. Altamirano-Sánchez. (2013) Dry Etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stack. Microelectronic Engineering 105, pages 60-64.
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Huang-Chung Cheng, Chun-Yu Wu, Po-Yen Hsu, Chao-Lung Wang, Ta-Chuan Liao & You-Lin Wu. (2012) High Sensitivity of Dry-Type Nanowire Sensors With High- $k$ Dielectrics for pH Detection via Capillary Atomic Force Microscope Tip Coating Technique. IEEE Electron Device Letters 33:9, pages 1312-1314.
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Davoud Zamani, M. Keswani, O. Mahdavi, Jun Yan, S. Raghavan & F. Shadman. (2012) Dynamics of Interactions Between HF and Hafnium Oxide During Surface Preparation of High-K Dielectrics. IEEE Transactions on Semiconductor Manufacturing 25:3, pages 511-515.
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Farhang Shadman. (2012) Environmental challenges in nanoelectronics manufacturing. Current Opinion in Chemical Engineering 1:3, pages 258-268.
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Paul Bodart, Gilles Cunge, Olivier Joubert & Thorsten Lill. (2012) SiCl4/Cl2 plasmas: A new chemistry to etch high-k materials selectively to Si-based materials. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30:2.
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Jungki Lee, Dongsun Kim, Sungmin Lee & Hyungsun Kim. (2012) Effect of rare-earth elements on the plasma etching behavior of the RE–Si–Al–O glasses. Journal of Non-Crystalline Solids 358:5, pages 898-902.
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Sufi Zafar, Christopher D’Emic, Ali Afzali, Benjamin Fletcher, Y Zhu & Tak Ning. (2011) Optimization of pH sensing using silicon nanowire field effect transistors with HfO 2 as the sensing surface . Nanotechnology 22:40, pages 405501.
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Dae‐Min Kim, Sang‐Ho Lee, William B. Alexander, Kyeong‐Beom Kim, Yoon‐Suk Oh & Sung‐Min Lee. (2011) X‐Ray Photoelectron Spectroscopy Study on the Interaction of Yttrium–Aluminum Oxide with Fluorine‐Based Plasma. Journal of the American Ceramic Society 94:10, pages 3455-3459.
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Dae-Min Kim, Yoon-Suk Oh, Seongwon Kim, Hyung-Tae Kim, Dae-Soon Lim & Sung-Min Lee. (2011) The erosion behaviors of Y2O3 and YF3 coatings under fluorocarbon plasma. Thin Solid Films 519:20, pages 6698-6702.
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J.H. Choi, Y. Mao & J.P. Chang. (2011) Development of hafnium based high-k materials—A review. Materials Science and Engineering: R: Reports 72:6, pages 97-136.
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Nathan Marchack & Jane P Chang. (2011) Perspectives in nanoscale plasma etching: what are the ultimate limits?. Journal of Physics D: Applied Physics 44:17, pages 174011.
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Tae-Kyung Ha, Jong-Chang Woo & Chang-Il Kim. (2011) Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system. Vacuum 85:10, pages 932-937.
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Ingrid Vos, David Hellin, Werner Boullart & Johan Vertommen. (2011) Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-κ/metal gate stacks. Microelectronic Engineering 88:1, pages 21-27.
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Muhammad M. Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano & Karen A. Reinhardt. 2010. Handbook of Cleaning in Semiconductor Manufacturing. Handbook of Cleaning in Semiconductor Manufacturing 237 284 .
Tae-Kyung Ha, Jong-Chang Woo & Chang-Il Kim. (2010) Etching Characteristics of HfAlO 3 Thin Films Using an Cl 2 /BCl 3 /Ar Inductively Coupled Plasma . Transactions on Electrical and Electronic Materials 11:4, pages 166-169.
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X. Li, H. Zhou, R.J.W. Hill, P. Longo, M. Holland & I.G. Thayne. (2010) Dry etching device quality high-κ GaxGdyOz gate oxide in SiCl4 chemistry for low resistance ohmic contact realisation in fabricating III–V MOSFETs. Microelectronic Engineering 87:5-8, pages 1587-1589.
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Jae-Kwan Kim, Jun Young Kim, Seung-Cheol Han, Joon Seop Kwak, Han-Ki Kim & Ji-Myon Lee. (2010) Wet Chemical Etching of Zn-Containing Oxide and HfO[sub 2] Films. Journal of The Electrochemical Society 157:8, pages D462.
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