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Journal of the Chinese Institute of Engineers Volume 33, 2010 - Issue 6
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Original Articles

The effects of deposition temperatures on the characteristics of nitrogenated carbon films deposited on p‐type silicon substrates by thermal chemical vapor deposition

Chia‐Ya Lin Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung 402, Taiwan, R.O.C.
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Sham‐Tsong Shiue Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung 402, Taiwan, R.O.C. Phone: +886–4–22857211 Fax: +886–4–22857211 E-mail: [email protected]
Pages 891-897 | Received 16 Jan 2009, Accepted 27 Jul 2009, Published online: 04 Mar 2011

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