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Integrated Ferroelectrics
An International Journal
Volume 11, 1995 - Issue 1-4
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Original Articles

Dry etching of Pt/PbZrxTi1−xO3/Pt thin film capacitors in an inductively coupled plasma (ICP)

Chee Won Chung Materials and Devices Research Center, Samsung Advanced Institute of Technology, P.O. Box 111, Suwon, 440–600, Korea
,
Wan In Lee Materials and Devices Research Center, Samsung Advanced Institute of Technology, P.O. Box 111, Suwon, 440–600, Korea
&
June Key Lee Materials and Devices Research Center, Samsung Advanced Institute of Technology, P.O. Box 111, Suwon, 440–600, Korea
Pages 259-267 | Received 05 Apr 1995, Published online: 19 Aug 2006

Citations (12)

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Read on this site (2)

Elliott Philofsk & Sanjay Mitra. (1998) A qualitative model for degradation of FRAM® products during plastic packaging. Integrated Ferroelectrics 21:1-4, pages 145-153.
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Chee Won Chung, June K. Lee, Chang Jung Kim & Ilsub Chung. (1997) Fabrication and comparison of ferroelectric capacitor structures for memory applications. Integrated Ferroelectrics 16:1-4, pages 139-147.
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Articles from other publishers (10)

C. Soyer, E. Cattan & D. Rèmiens. (2005) Electrical damage induced by reactive ion-beam etching of lead-zirconate-titanate thin films. Journal of Applied Physics 97:11.
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Kyu-Tae Lim, Kyoung-Tae Kim, Dong-Pyo Kim & Chang-II Kim. (2003) Etch characteristics of Bi4−xEuxTi3O12 (BET) thin films using inductively coupled plasma. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21:4, pages 1475-1481.
Crossref
Chee Won Chung, Yo Han Byun & Hye In Kim. (2002) Inductively coupled plasma etching of a Pb(ZrxTi1−x)O3 thin film in a HBr/Ar plasma. Microelectronic Engineering 63:4, pages 353-361.
Crossref
Chee Won Chung, Yo Han Byun & Hye In Kim. (2002) Inductively coupled plasma etching of Pb(ZrxTi1-x)O3 thin films in Cl2/C2F6/Ar and HBr/Ar plasmas. Korean Journal of Chemical Engineering 19:3, pages 524-528.
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Yong Kyun Lee, June Key Lee, Chang Jung Kim, Insook Yi & Ilsub Chung. (2011) Preparation of sub-100nm Thickness PZT thin Films with Chemical Solution Deposition Method for low Voltage Operation. MRS Proceedings 655.
Crossref
Jin Hong Kim, Seong Ihl Woo, Byung Yun Nam & Won Jong Yoo. (1999) Anisotropic etching characteristics of platinum electrode for ferroelectric capacitor. IEEE Transactions on Electron Devices 46:5, pages 984-992.
Crossref
J. H. Kim & S. I. Woo. (1998) Chemical Dry Etching of Platinum Using Cl 2 /CO Gas Mixture . Chemistry of Materials 10:11, pages 3576-3582.
Crossref
Chee Won Chung. (1998) Reactive ion etching of Pb(ZrxTi1−x)O3 thin films in an inductively coupled plasma. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 16:4, pages 1894-1900.
Crossref
K. R. Milkove, J. A. Coffin & C. Dziobkowski. (1998) Effects of argon addition to a platinum dry etch process. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16:3, pages 1483-1488.
Crossref
Chee Won Chung, Inyong Song & Jong Sig Lee. (2011) Investigation of ETCH Profiles in Etching of PZT and Pt Thin Films. MRS Proceedings 493.
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