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Integrated Ferroelectrics
An International Journal
Volume 57, 2003 - Issue 1
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Original Articles

Deposition of High-k Dielectric Oxide Films by Liquid Injection MOCVD

Anthony C. Jones Department of Chemistry, University of Liverpool, Liverpool, L69 3ZD, UK; Epichem Oxides and Nitrides Division, Power Road, Bromborough, Wirral, Merseyside, CH62 3QF, UK
,
Paul A. Williams Epichem Oxides and Nitrides Division, Power Road, Bromborough, Wirral, Merseyside, CH62 3QF, UK
,
Paul R. Chalker Department of Materials Science and Engineering, University of Liverpool, Liverpool, L69 3BX, UK
,
Stephen Taylor Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool, L69 3GJ, UK
,
Ahmad Zoolfakr Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool, L69 3GJ, UK
,
Lesley M. Smith Epichem Oxides and Nitrides Division, Power Road, Bromborough, Wirral, Merseyside, CH62 3QF, UK
&
Philip McGraw Epichem Oxides and Nitrides Division, Power Road, Bromborough, Wirral, Merseyside, CH62 3QF, UK
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Pages 1271-1277 | Published online: 18 Jun 2010

Citations (5)

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Read on this site (1)

A. S. Zoolfakar. (2009) Study of zirconium dioxide (ZrO2) dielectric charges. Materials Research Innovations 13:3, pages 161-164.
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Articles from other publishers (4)

A.S. Zoolfakar & H. Hashim. (2008) A comparative study between zirconium dioxide and hafnium dioxide dielectric charges. A comparative study between zirconium dioxide and hafnium dioxide dielectric charges.
G. Scarel, C. Wiemer, M. Fanciulli, I. L. Fedushkin, G. K. Fukin, G. A. Domrachev, Y. Lebedinskii, A. Zenkevich & G. Pavia. (2007) [(Me3Si)2N]3Lu: Molecular Structure and Use as Lu and Si Source for Atomic Layer Deposition of Lu Silicate Films. Zeitschrift für anorganische und allgemeine Chemie 633:11-12, pages 2097-2103.
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Yim Fun Loo, Stephen Taylor, Robert T. Murray, Anthony C. Jones & Paul R. Chalker. (2006) Structural and electrical characterization of amorphous lanthanum hafnium oxide thin films. Journal of Applied Physics 99:10.
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G. Scarel, C. Wiemer, G. Tallarida, S. Spiga, G. Seguini, E. Bonera, M. Fanciulli, Y. Lebedinskii, A. Zenkevich, G. Pavia, I. L. Fedushkin, G. K. Fukin & G. A. Domrachev. (2006) Atomic Layer Deposition of Lu Silicate Films Using [(Me[sub 3]Si)[sub 2]N][sub 3]Lu. Journal of The Electrochemical Society 153:11, pages F271.
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