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Integrated Ferroelectrics
An International Journal
Volume 94, 2007 - Issue 1
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Original Articles

CRYSTALLIZATION BEHAVIOR OF HfO2 FILMS FOR (Y,Yb)MnO3/HfO2/Si STRUCTURES

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Pages 3-10 | Received 15 Jun 2007, Accepted 30 Sep 2007, Published online: 20 Sep 2010
 

ABSTRACT

The effects of the hydrolysis of HfO2 precursor solution on the microstructure evolution at low temperature were investigated. The microstructures of HfO2 films prepared using non-hydrolyzed precursor solution significantly changed around at 300°C and the large surface roughness was led by microstructure change. The partially hydrolysis of precursor solution was effective for restrain of increase of surface roughness. The refractive index of the HfO2 films prepared using partially hydrolyzed solution were higher than that of the films prepared using non-hydrolyzed solution. The partially hydrolysis of the HfO2 solution was found to be effective for formation of uniform and dense structure.

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