Figures & data
Figure 1 Calculated equilibrium chemistries in the (a) Ar–H–O–Si and (b) Ar–H–O–Si–C system under the conditions equivalent to the experiment shown in table .
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Table 1. List of the plasma spray conditions.
Figure 2 FE-SEM images of the raw SiO (a), plasma sprayed (PS-PVD) powder with CH4 addition (C/Si = 1) (b) and its higher magnitudes (c).
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Figure 3 Comparison of the particle size distribution of the PS-PVD powders between the powders produced with different CH4 additions (volumetric frequency basis).
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Figure 4 HR-TEM images of the PS-PVD SiO powders processed (a) without and (b) with 1.1 slm CH4 gas addition.
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Figure 5 Change in the EEL spectra of the Si–L edge within the SiOx particle of the PS-PVD powders processed with and without CH4 gas addition. The positions of the EELS analysis are indicated in the STAM HAADF images.
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Table 2. Relative amount (wt%) of phases present in the PS-PVD powder mixture, estimated by Rietveld analysis of the XRD patterns shown in figure .
Figure 7 Change in the initial capacity with voltage for the PS-PVD powders with different C/Si ratios. The battery was charged at a constant current of 0.1 mA, and the cut-off voltage was set to 0 V. The initial efficiency (%) is shown next to the C/Si.
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Figure 8 Capacity change with number of cycle for PS-PVD powders processed with different CH4 gas additions. The battery was charged at a constant current of 0.1 mA for the first three cycles and at 0.5 mA for the rest of the cycles.
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