References
- LiuX HZhongLHuangSMaoS XZhuTHuangJ Y 2012 ACS Nano 6 1522 1531 1522–31 10.1021/nn300436b
- GraetzJAhnC CYazamiRFultzB 2003 Electrochem. Solid-State Lett. 6 A194 A197 A194–7 10.1149/1.1596917
- ChanC KPengHLiuGMcIlwrathKZhangX FHugginsR ACuiY 2008 Nat. Nanotechnology 3 31 35 31–5 10.1038/nnano.2007.411
- MagasinskiADixonPHertzbergBKvitAAyalaJYushinG 2010 Nat. Mater. 9 353 358 353–8 10.1038/nmat2725
- NgS-HWangJWexlerDKonstantinovKGuoZ-PLiuH-K 2006 Angew. Chem. Int. Ed. 45 6896 6899 6896–9 10.1002/(ISSN)1521-3773
- DohC-HShinH-MKimD-HHaY-CJinB-SKimH-SmoonS-IVeluchamyA 2008 Electrochem. Commun. 10 233 237 233–7 10.1016/j.elecom.2007.11.034
- MamiyaMTakeiHKikuchiMUyedaC 2001 J. Cryst. Growth 229 457 461 457–61 10.1016/S0022-0248(01)01202-7
- WangJWangX FLiQHryciwAMeldrumA 2007 Philos. Mag. 87 11 27 11–27 10.1080/14786430600863047
- ParkC-MChoiWHwaYKimJ-HJeongGSohnH-J 2010 J. Mater. Chem. 20 4854 4860 4854–60 10.1039/b923926j
- KimJ-HSohnH-JKimHJeongGChoiW 2007 J. Power Sources 170 456 459 456–9 10.1016/j.jpowsour.2007.03.081
- MiyachiMYamamotoHKawaiHOhtaTShirakataM 2005 J. Electrochem. Soc. 152 A2089 A2091 A2089–91 10.1149/1.2013210
- KambaraMHideshimaTHommaKKagaMSheemK-YIshidaSYoshidaT 2014 J. Appl. Phys. 115 143302 10.1063/1.4870600
- YoshidaT 1994 Pure Appl. Chem. 66 1223 1230 1223–30 10.1351/pac199466061223
- BibikovM BDemkinS AZhivotovV KZaitsevS AMoskovskiiA SSmirnovR VFateevV N 2010 High Energy Chem. 44 58 62 58–62 10.1134/S0018143910010091
- ColdwellD MRoquesR A 1977 J. Electrochem. Soc. 124 168 169 168–9 10.1149/1.2133137
- HuczkoAMeubusP 1989 Plasma Chem. Plasma Process 9 371 386 371–86 10.1007/BF01083673
- MexmainJ MMorvanDBourdinEAmourouxJFauchaisP 1983 Plasma Chem. Plasma Process 3 393 420 393–420 10.1007/BF00564627
- SchnurreS MGrobnerJSchmid-FetzerR 2004 J. Non-Cryst. Solids 336 1 25 1–25 10.1016/j.jnoncrysol.2003.12.057
- FergusonF TNuthJ A III 2008 J. Chem. Eng. Data 53 2824 2832 2824–32 10.1021/je800560b
- MargraveJ L 1967 The Characterization of High-Temperature Vapors New York Wiley
- TakamuraYHayashiKTerashimaKYoshidaT 1996 Plasma Chem. Plasma Process 16 S141 S156 S141–56 10.1007/BF01512632
- HuangHEguchiKKambaraMYoshidaT 2006 J. Thermal Spray Technol. 15 83 91 83–91 10.1361/105996306X92640
- YoungR A 1993 The Rietveld Method Oxford Oxford University Press
- WeastR C 1992 Handbook of Chemistry and Physics 73rd edn Boca Raton, FL CRC
- KangKLeeH-SHanD-WKimG-SLeeDLeeGKangY MJoM H 2010 Appl. Phys. Lett. 96 053110 10.1063/1.3299006
- KagaMHideshimaTKambaraM 2014 JPS Conf. Proc. 1 015073 10.7566/jpscp.1.015073
- KambaraMOdaNHommaK 2014 submitted