https://orcid.org/0000-0002-1040-9550
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Abstract
An ultra-wideband metamaterial absorber (MA) based on the resistive film is proposed. Unlike conventional MAs based on the resistive film, the proposed absorber features a hybrid resonant layer of resistive film and metal patch at the same top layer. The absorption of the proposed absorber exceeds 90% over the ultra-wideband frequency range of 20 –220 THz, covering most of the infrared region, while the relative absorption bandwidth is up to 167%. The coupling of resistive film and metal pattern at the same layer plays the significant role in enhancing the absorption performance, which is interpreted by the investigation of the surface current distribution. Moreover, the absorber is insensitive to polarization and incident angle. The proposed absorber with high absorption capability as well as simple and compact structure is a proper candidate for the applications in the infrared frequency regime.
Disclosure statement
No potential conflict of interest was reported by the author(s).