A facile approach to fabricate few-layer chemically modified and reduced graphene oxide sheets: Combination of stitching, reduction and functionaliztion

ABSTRACT

A facile strategy for the preparation of few-layer chemically stitched and reduced graphene oxide (FL-CMRG) in water using various linear diaminoalkanes with the general formula H₂N(CH₂)_nNH₂ (n = 4, 6, 8) is proposed, and the resulting FL-CMRG was characterized by means of AFM, TEM, XPS, UV-vis, TGA and XRD. Interlayer spacing between bridged FL-CMRG sheets can reach 1.038 nm when the size of the intercalant to (n = 6) H₂N (CH₂)₆ NH₂. A mechanism for forming the FL-CMRG via removal of epoxide and hydroxyl groups from GO and stitching of the GO sheets by various linear diaminoalkanes in water solution has been proposed.

KEYWORDS:

• graphene oxide
• linear diaminoalkane
• reduction and functionaliztion
• few-layer

Additional information

Funding

The authors acknowledge the financial support from Shanghai Municipal Commission for Science and Technology (No.15ZR1448300), and National Natural Science Foundation of China (No.11505270 and No.11575277).