Characterization of thin film of CuO nanorods grown with a chemical deposition method: a study of significance of deposition time

Abstract

In this study, vertically aligned copper oxide (CuO) nanorods were grown on indium tin oxide substrate using chemical bath deposition as a facile and economical method. The effect of deposition times on the morphological, structural, optical, and electrical properties of CuO nanorods was investigated. X-ray diffraction analysis confirmed one-dimensional growth of CuO nanorods along the preferred plane of (002). Field emission scanning electron microscopy analysis revealed the growth of vertically aligned nanorods for all deposition times. It was observed that the length of nanorods and UV–vis absorption of the CuO thin films was increased with duration of growth. Current-voltage response of the samples was investigated and the results showed a linear behavior for all samples. Electrical resistance of nanorods was also measured. The results showed that the electric resistance decreases with increasing the growth time up to 90 min and it increases afterwards.

Keywords:

• Copper oxide
• nanorods
• ITO
• chemical deposition