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Science and Technology of Advanced Materials Volume 4, 2003 - Issue 6
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Human-Friendly Materials Based on Chemistry

Mass spectrometric study of low-pressure inductively coupled plasma for chemical vapor deposition of cubic boron nitride films

Hangsheng YangDepartment of Materials Engineering, School of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo-ku, Tokyo, 113-8656, Japan
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Toyonobu YoshidaCorrespondence[email protected]
Pages 613-616 | Received 03 Sep 2003, Accepted 12 Sep 2003, Published online: 04 Feb 2004

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