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IETE Journal of Research Volume 37, 1991 - Issue 2
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Original Articles

Chemical Vapour Deposition of Tungsten by the Reduction of WF6 using Si, SiH4, Si2H6, Si3H8, B2H6, PH3, and H2

Takayuki OhbaBasic Process Development Department, Fujitsu Limited, 1015 Kamikodanaka, Nakahara-ku, Kawasaki211, Japan
&
Yuji FurumuraBasic Process Development Department, Fujitsu Limited, 1015 Kamikodanaka, Nakahara-ku, Kawasaki211, Japan
Pages 212-219 | Published online: 02 Jun 2015

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