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Radiation Effects and Defects in Solids
Incorporating Plasma Science and Plasma Technology
Volume 166, 2011 - Issue 11
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Original Articles

Comment on “Isotopic mass effects for low-energy channeling in a silicon crystal”

Zhu Lin Zhang College of Mathematics and Physics, Anhui University of Science and Technology, Huainan, Anhui, 232001, People's Republic of China
,
Lai Zhang Department of Mechanical Engineering, Colorado State University, Fort Collins, Colorado, 80523, USACorrespondence[email protected]
&
Karur R. Padmanabhan Department of Physics and Astronomy, Wayne State University, Detroit, MI, 48202, USA
Pages 866-869 | Received 07 Sep 2010, Accepted 19 Oct 2010, Published online: 15 Jan 2011

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