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Integrated Ferroelectrics
An International Journal
Volume 14, 1997 - Issue 1-4
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Materials processing - PVD

High reliable lead-zirconate-titanate growth using reactive sputtering and rapid thermal annealing

Satoshi Yamauchi VLSI R&D Center, Oki Electric Industry Co., Ltd., Tokyo, 193, Japan
&
Masaki Yoshimaru VLSI R&D Center, Oki Electric Industry Co., Ltd., Tokyo, 193, Japan
Pages 159-166 | Received 18 Mar 1996, Published online: 19 Aug 2006

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